Integrated design for integrated photonics: from the physical to the circuit level and back

Bogaerts, Wim; Li, Yanlu; Pathak, Shibnath; Ruocco, Alfonso; Fiers, Martin; Ribeiro, A. B. Lobo; Lambert, Emmanuel; Dumon, Pieter

doi:10.1117/12.2017761

Cited by 15 publications

(13 citation statements)

References 27 publications

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“…Such virtual fabrication , particularly when lithography effects are included, is an essential aid for exploring the design space of photonic components, as it enables the designer to start from (parametric) layouts that later need to be used as circuit building blocks. Also, some photonic circuit design tools integrate with electromagnetic simulators to automatically run simulations of building blocks …”

Section: Silicon Photonics Design Todaymentioning

confidence: 99%

Silicon Photonics Circuit Design: Methods, Tools and Challenges

Bogaerts

Chrostowski

2018

Laser & Photonics Reviews

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Silicon Photonics technology is rapidly maturing as a platform for larger‐scale photonic circuits. As a result, the associated design methodologies are also evolving from component‐oriented design to a more circuit‐oriented design flow, that makes abstraction from the very detailed geometry and enables design on a larger scale. In this paper, the state of this emerging photonic circuit design flow and its synergies with electronic design automation (EDA) are reviewed. The design flow from schematic capture, circuit simulation, layout and verification is covered. The similarities and the differences between photonic and electronic design, and the challenges and opportunities that present themselves in the new photonic design landscape, such as variability analysis, photonic‐electronic co‐simulation and compact model definition are discussed.

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Section: Silicon Photonics Design Todaymentioning

confidence: 99%

Silicon Photonics Circuit Design: Methods, Tools and Challenges

Bogaerts

Chrostowski

2018

Laser & Photonics Reviews

Self Cite

420

230

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“…Grating couplers were implemented for vertical coupling of light to and from the chip [19]. We used the IPKISS design framework to design and simulate the arrayed waveguide grating circuit [20].…”

Section: Fabrication and Designmentioning

confidence: 99%

Compact Silicon Nitride Arrayed Waveguide Gratings for Very Near-Infrared Wavelengths

Martens

Subramanian

Pathak

et al. 2015

IEEE Photon. Technol. Lett.

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Abstract-In this letter, we report a novel high-index-contrast silicon nitride arrayed waveguide grating (AWG) for very nearinfrared wavelengths. This device is fabricated through a process compatible with a complementary metal-oxide-semiconductor fabrication line and is therefore suitable for mass fabrication. The large phase errors that usually accompany high-index-platform AWGs are partly mitigated through design and fabrication adaptions, in particular the implementation of a two-level etch scheme. Multiple devices are reported, among which a 0.3-mm 2 device which, after the subtraction of waveguides loss, has a −1.2 dB on-chip insertion loss at the peak of the central channel and 20-dB crosstalk for operation ∼900 nm with a channel spacing of 2 nm. These AWGs pave the way for numerous largescale on-chip applications pertaining to spectroscopy and sensing.

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“…We have designed the devices using the IPKISS parametric design framework [9]. The fabricated MZI filter scanning electron microscope (SEM) image is shown in Fig.3.…”

Section: Fabrication and Measurementsmentioning

confidence: 99%

Maximizing Fabrication and Thermal Tolerances of All-Silicon FIR Wavelength Filters

Dwivedi

D'heer

Bogaerts

2015

IEEE Photon. Technol. Lett.

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Abstract-We propose a method to make silicon optical finite impulse response filters tolerant to fabrication (waveguide geometry) and ambient thermal variations. We experimentally demonstrate a Mach-Zehnder interferometer filter with fabrication and thermal tolerance, both separately and together. The fabrication-tolerant device measurements show a 20-fold improved tolerance to systematic waveguide linewidth variations with a wavelength shift of <60 pm/nm linewidth change. The fabrication-and thermal-tolerant device is possible using orthogonal polarizations in the two arms. The fabricated device shows a shift of less than ±65 pm/nm and a thermal drift smaller than ±15 pm/K over a wavelength range of 40 nm. Simulations show that this concept can be extended to multichannel filters.

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Integrated design for integrated photonics: from the physical to the circuit level and back

Cited by 15 publications

References 27 publications

Silicon Photonics Circuit Design: Methods, Tools and Challenges

Silicon Photonics Circuit Design: Methods, Tools and Challenges

Compact Silicon Nitride Arrayed Waveguide Gratings for Very Near-Infrared Wavelengths

Maximizing Fabrication and Thermal Tolerances of All-Silicon FIR Wavelength Filters

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