Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures

Macías-Montero, Manuel; García‐García, Francisco J.; Álvarez, Rafael; Gil-Rostra, Jorge; González, Jaime; Cotrino, José; González‐Elipe, Agustín R.; Palmero, Alberto

doi:10.1063/1.3691950

Cited by 30 publications

(26 citation statements)

References 36 publications

(39 reference statements)

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“…From this, it is known that classical MS depositions, in which the growth surface is parallel to the target, usually yield dense and compact films, thanks mostly to the high energy of the deposition particles and the impingement of plasma ions during growth [296,297]. In contrast, when deposition is carried out in an OAD configuration, other processes may play important roles in the development of columnar and porous nanostructures [212].…”

Section: Magnetron Sputtering Deposition At Oblique Anglesmentioning

confidence: 98%

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Barranco

Borrás

González‐Elipe

et al. 2016

Progress in Materials Science

599

436

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a b s t r a c tThe oblique angle configuration has emerged as an invaluable tool for the deposition of nanostructured thin films. This review develops an up to date description of its principles, including the atomistic mechanisms governing film growth and nanostructuration possibilities, as well as a comprehensive description of the applications benefiting from its incorporation in actual devices. In contrast with other reviews on the subject, the electron beam assisted evaporation technique is analyzed along with other methods operating at oblique angles, including, among others, magnetron sputtering and pulsed laser or ion beam-assisted deposition techniques. To account for the existing differences between deposition in vacuum or in the presence of a plasma, mechanistic simulations are critically revised, discussing well-established paradigms such as the tangent or cosine rules, and proposing new models that explain the growth of tilted porous nanostructures. In the second part, we present an extensive description of applications wherein oblique-angle-deposited thin films are of relevance. From there, we proceed by considering the requirements of a large number of functional devices in which these films are currently being utilized (e.g., solar cells, Li batteries, electrochromic glasses, biomaterials, sensors, etc.), and subsequently describe how and why these nanostructured materials meet with these needs.

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Section: Magnetron Sputtering Deposition At Oblique Anglesmentioning

confidence: 98%

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Barranco

Borrás

González‐Elipe

et al. 2016

Progress in Materials Science

599

436

View full text Add to dashboard Cite

show abstract

“…For instance, in refs. , we studied the influence of some experimental controllable parameters (e.g. deposition pressure, tilt angle of the substrate, ion impingement, etc.)…”

Section: Introductionmentioning

confidence: 99%

Growth of nanocolumnar thin films on patterned substrates at oblique angles

García-Valenzuela

Muñoz‐Piña

Alcalá

et al. 2018

Plasma Processes & Polymers

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The influence of one dimensional substrate patterns on the nanocolumnar growth of thin films deposited by magnetron sputtering at oblique angles is theoretically and experimentally studied. A well-established growth model has been used to study the interplay between the substrate topography and the thin film morphology. A critical thickness has been defined, below which the columnar growth is modulated by the substrate topography, while for thicknesses above, the impact of substrate features is progressively lost in two stages; first columns grown on taller features take over neighboring ones, and later the film morphology evolves independently of substrate features. These results have been experimentally tested by analyzing the nanocolumnar growth of SiO 2 thin films on ioninduced patterned substrates. K E Y W O R D S magnetron sputtering, nanostructures, oblique angle deposition, patterned substrate, thin films Plasma Process Polym. 2019;16:e1800135.www.plasma-polymers.com

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“…The fact that removal of cracks propagation occurred with SiO 2 ‐0° but not with TiO 2 ‐0° was accounted for by the impingement of highly energetic negative ions of oxygen formed in the plasma during the MS deposition of SiO 2 but not TiO 2. A singular effect of this enhanced ion bombardment is the formation of a homogeneous and compact SiO 2 layer with a low surface roughness (see AFM images in Figure S6 in the Supporting Information) on which a TiO 2 ‐0° film may grow in compact form with no cracks (see Figure S4 in the Supporting Information).…”

Section: Resultsmentioning

confidence: 99%

Environmentally Tight TiO₂–SiO₂ Porous 1D‐Photonic Structures

García-Valenzuela

López‐Santos

Rico

et al. 2018

Adv Materials Inter

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materials with different refractive indexes (e.g., TiO 2 and SiO 2 ), has been proposed as a way of tailoring the optical behavior of broadband antireflection coatings used to maximize the performance of photovoltaic cells. [8] Porosity is also a key characteristic when preparing Bragg stacks acting as optical and optofluidic sensors for the detection of vapors or for liquid monitoring, respectively. [9] According to the principles of the effective medium approximation theory, [10] porosity can be utilized to adjust the overall refraction index of thin films as an average of the contributions of air (n air = 1.0) and film material (i.e., n b ). However, the adjustment of the optical properties of porous films faces the critical problem of their environmental instability due to the condensation of water (n w = 1.31) and other vapors into their open pores. Although this effect has been utilized for the optical detection of vapors using stacks of thin films in the form of Bragg structures, [9a,b,10] the affectation of optical properties in multilayers acting as 1D photonic structures can be a serious problem when dealing with passive optical systems. [12] This is clear in solar cells and other outdoor applications where optical instabilities due to water condensation have to be suppressed by polymer encapsulation during device assembly. In the present work, we propose the use porosity as an additional parameter to control the optical properties of multilayer stacks but, simultaneously, ensuring its environmental tightness and therefore, a stable outdoor functioning. To enhance film porosity we use the technique of magnetron sputtering at oblique angles (MS-OAD). [13] This geometrical configuration, either by e-beam evaporation or magnetron sputtering (MS), induces the growth of nanocolumnar films with porosities that may reach up to 50-60% of the film volume. [14] Highly porous OAD films and multilayers have been utilized in the pass for the fabrication of antireflection layers for passive optical applications, [7,11a,b] photo catalytic layers, [5,10a] humidity and other vapor sensors [10a,b,15] or optofluidic devices. [9c,d,16] Herein, we firstly prove that the optical behavior of MS-OAD multilayers in the form of Bragg reflectors (BR) or Bragg microcavities (BM) can be tailored by adjusting the porosity of the TiO 2 and SiO 2 thin films (e.g., making the TiO 2 compact and the SiO 2 highly porous, as proposed in previous works [7,12c] ). Then, using an optical monitoring procedure previously applied to study vapor Although thin film porosity is the basis of many optical sensors, it can be deleterious for a stable optical behavior of passive optical elements due to the condensation of water and other vapors in their pores. This paper proposes a new strategy for the magnetron sputtering (MS) fabrication of environmentally tight SiO 2 -TiO 2 porous multilayers. Thin films of these two oxides deposited in an oblique angle configuration (MS-OAD) present a nanocolumnar and highly porous nanostructure and, as ...

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Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures

Cited by 30 publications

References 36 publications

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Growth of nanocolumnar thin films on patterned substrates at oblique angles

Environmentally Tight TiO₂–SiO₂ Porous 1D‐Photonic Structures

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Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures

Cited by 30 publications

References 36 publications

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Growth of nanocolumnar thin films on patterned substrates at oblique angles

Environmentally Tight TiO2–SiO2 Porous 1D‐Photonic Structures

Contact Info

Product

Resources

About

Environmentally Tight TiO₂–SiO₂ Porous 1D‐Photonic Structures