Influence of oxygen flow and film thickness on the texture and microstructure of sputtered ceria thin films

Steenberge, Sigelinde Van; Leroy, Wouter; Depla, Diederik

doi:10.1016/j.tsf.2013.11.049

Cited by 30 publications

(19 citation statements)

References 35 publications

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“…The flow control is important as other studies have shown, the structure of thin films deposited by magnetron sputtering being characterized by a function of gas flow and film thickness. [10] The machine is equipped with a box that generates vacuum. The box has a variable speed travel.…”

Section: Research On Laboratory Pilot Installations For Glass Processmentioning

confidence: 99%

Simulating the Magnetron Sputtering Process for Industrial Applications

Ionut¹,

Nicolescu²,

Coman³

et al. 2016

Proceedings of the 27th International DAAAM Symposium 2016

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This paper presents a new method of simulating the process of thin layer glass coating by magnetron sputtering on real industrial scale equipment and in real industrial application as well as necessary experimental results for the validation of the new developed mathematical formulation and software algorithm. Based on major differences between applications realized with laboratory equipment studied until now by other authors and the real scale industrial installations analyzed in present paper, development of a new mathematical model, simulation method and process control of magnetron sputtering systems by ionized physical vapor deposition (IPVD) was needed. Improvement of the deposition process by applying this new concept on industrial scale is discussed for different material types, specific deposition energy levels and the uniformity of the deposed layers based on simulation and experimental results analysis.

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Section: Research On Laboratory Pilot Installations For Glass Processmentioning

confidence: 99%

Simulating the Magnetron Sputtering Process for Industrial Applications

Ionut¹,

Nicolescu²,

Coman³

et al. 2016

Proceedings of the 27th International DAAAM Symposium 2016

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“…A Cauchy model was deemed appropriate for the ceria films, because they are fully oxidized and transparent. 15 So, a Cauchy/SiO 2 /INTR/Si model was used, which resulted in a good agreement between experimental data and fit. The film porosity was calculated from the measured refractive index using the Lorentz-Lorenz model.…”

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confidence: 96%

“…At a higher EPA or under zone II conditions, the thin films have a [111] fiber texture. 15 Target erosion will alter the angular distribution of the negative ions, but in this paper, the possible change of the energy flux and deposition rate in relation to the texture of the deposited CeO 2 thin films is also studied. In this way, the momentum and energy transfer can be separately investigated.…”

mentioning

confidence: 99%

“…3 sccm of O 2 was added to fully poison the target. 15 conditions, thin films of around 200 nm were grown by adjusting the deposition time. Their thickness was measured with a contact profilometer (Taylor-Hobson Talystep).…”

mentioning

confidence: 99%

“…The texture was examined by means of X-ray diffraction (XRD), using Cu K a radiation and a LynxEye Silicon Strip detector, in the Bragg-Brentano geometry. More details can be found in Van Steenberge et al 15 These depositions were alternated with energy flux measurements using a thermal probe and energy resolved mass spectrometry, until the target reached an advanced state of erosion. An energy dispersive quadrupole ion mass spectrometer (Hiden Analytical, EQP 1000) with an orifice of 50 lm and an acceptance angle of 2.1 (Ref.…”

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confidence: 99%

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Momentum transfer driven textural changes of CeO2 thin films

Steenberge

Leroy

Hubin

et al. 2014

Applied Physics Letters

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The influence of the target erosion depth on the film texture was investigated during DC reactive magnetron sputter deposition of CeO2 thin films. Three fluxes towards the substrate surface (the relative negative oxygen ion flux, the material flux, and the energy flux) were measured and related to the ongoing erosion of a cerium target. As the deposition rate increased for more eroded targets, both the energy flux and the negative ion flux decreased. Cerium oxide thin films that were deposited at different target erosion states, exhibited a change in preferential crystalline orientation from [200] to [111]. This textural change cannot be explained in terms of the energy per arriving atom concept. Instead, it is shown that the momentum of the high energetic negative ions is an essential condition to clarify the witnessed trends.

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