volume 6, issue 53, P47698-47711 2016
DOI: 10.1039/c6ra09264k
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Abstract: Cr–B–C–N coatings with different boron contents (24.6–27.2 at%) were deposited on Si(100) wafers and 316L stainless steels by using closed-field unbalanced magnetron sputtering via adjusting the CrB2 target current.

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