volume 25, issue 6, P817-820 1998
DOI: 10.1029/98gl00354
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Abstract: Abstract. To control in situ oxygen fugacity in a sample at high temperature and high pressure, the oxygen pump that is usually used at ambient pressure was introduced into a highpressure system in the present work. Inside the sample assembly, an oxygen buffer was used as an oxygen reservoir. By means of our high-pressure oxygen pump, oxygen could be pumped from the sample into the oxygen reservoir or from the reservoir into the sample at high temperature and high pressure. Meanwhile, the oxygen fugacity in t…

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