2013
DOI: 10.1002/adma.201304770
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In Situ and Non‐Volatile Bandgap Tuning of Multilayer Graphene Oxide in an All‐Solid‐State Electric Double‐Layer Transistor

Abstract: The sp(2) /sp(3) domain fraction of multilayer graphene oxide (GO) is tuned in situ and in a non-volatile manner by using a proton-induced redox reaction at the interface of GO and the yttria-stabilized zirconia proton-conductor. This method opens the door for transparent, ultrathin, flexible, and low cost carbon-nanoionics devices that can control not only electronic transport, but also other properties such as photoluminescence and optics.

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Cited by 83 publications
(113 citation statements)
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“…On the other hand, as early as 1996, YSZ has already been successfully used as the buffer layer in FET, showing good insulating behavior [147]. In 2014, Tsuchiya [62]. They found sp 2 /sp 3 fraction variations in the GO and high EDL capacity because of the nanoionic motion of protons at the GO/YSZ interface.…”
Section: Yttria-stabilized Zirconiamentioning
confidence: 97%
See 1 more Smart Citation
“…On the other hand, as early as 1996, YSZ has already been successfully used as the buffer layer in FET, showing good insulating behavior [147]. In 2014, Tsuchiya [62]. They found sp 2 /sp 3 fraction variations in the GO and high EDL capacity because of the nanoionic motion of protons at the GO/YSZ interface.…”
Section: Yttria-stabilized Zirconiamentioning
confidence: 97%
“…Recently, a new study of yttria-stabilized zirconia (YSZ)-gated graphene oxide (GO) transistor based on proton conduction was reported by Tsuchiya et al [62]. The on/off ratio increased, while l FE decreased with the variation of I off , and both of them in the device can be tuned by the band-gap tuning (BGT).…”
Section: Carbon Nanotubes and Graphenementioning
confidence: 97%
“…Both of these behaviors agree well with that of a GO-EDLT previously fabricated using proton-conducting nanograined YSZ. 19,38 On the basis of the result, the redox reaction of GO can be safely achieved by proton migration in mesoporous SiO 2 thin film. Note that the fairly large i D around 0 V is attributed to the transient EDL charging current between source and drain electrodes, and that the scale out of i D in the V G range of 0.7 to 2.6 V was due to overlapping between very large i G and extremely small i D (several tens of pA).…”
Section: Resultsmentioning
confidence: 97%
“…[13][14][15] We recently reported a technique for in situ sp 2 /sp 3 tuning of GO in an all-solid-state electric double layer transistor (EDLT). 16 Reversible and nonvolatile tuning was achieved by using a solid electrochemical reaction due to proton migration in the solid electrolyte thin film. Modulation of the band gap, the field effect mobility of the electronic carrier, and the ON/OFF ratio in the electrostatic switching were demonstrated by electric transport and UV-Vis-near-infrared (NIR) reflectance measurement.…”
mentioning
confidence: 99%
“…Details of the fabrication procedure are described elsewhere. 16 The optical microscope (Nikon Eclipse ME600) had a 100-W halogen lamp. Electrochemical measurements were performed using a parameter analyzer (Keithley 4200-SCS).…”
mentioning
confidence: 99%