Improving the Properties of SrRuO3 Electrode Films Grown by Atomic Layer-Deposited SrO and Pulsed Chemical Vapor-Deposited RuO2 Using Al2O3 Capping Layers
Abstract:In this study, an Al 2 O 3 capping layer (ACL) was utilized to enhance the surface morphology and electrical properties of SrRuO 3 (SRO) electrode films deposited via combined atomic layer deposition and pulsed chemical vapor deposition. To crystallize the SRO films, postdeposition annealing (PDA) was necessary; however, this led to material agglomeration and degradation of the surface morphology. Therefore, to address this issue, the ACL was used to reduce agglomeration by inhibiting material migration. Next,… Show more
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