Ar+ irradiation and annealing at an elevated temperature are used to improve the adhesion of deposited Cr thin films by vacuum evaporation onto polyimide (PI) substrates. The Ar+ ions of 50 and 200 keV and various Ar+ doses ranging from 1 × 1013 to 2 × 1016 ions/cm2 are chosen for the experiments, after many preliminary trials. The surface analyses are conducted employing Rutherford Backscattering Spectroscopy (RBS), Fourier transform infrared spectrometry (FTIR), X‐ray photoelectron spectroscopy (XP…
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