Improvement of sawtooth shape generated by anisotropic etching process of single-crystal silicon for microparts feeding using horizontal and symmetric vibrations
Abstract:Etching process is a fabrication technology to generate a pattern on a single crystal silicon wafer. The etching process can generate stable and precise periodic pattern on the silicon wafer with a pitch of smaller than 100 µm order according to the etching mask on the surface and characteristics of surface plane orientation. Using a silicon wafer with a plain orientation of [221], an asymmetric periodic structure is generated on its surface because the etching speed is different between forward and backward o… Show more
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