2022
DOI: 10.1016/j.ceramint.2022.08.045
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Improved artificial synapse performance of Pt/HfO2/BiFeO3/HfO2/TiN memristor through N2 annealing

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Cited by 7 publications
(4 citation statements)
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“…We used the methods and obtained ideal linearity in our previous work. [ 37,38 ] In addition, the cross‐crosstalk phenomenon of the memristor array needs to be considered in the construction of an artificial neural network. It is necessary to eliminate the cross‐talk phenomena of the memristor array in future work.…”
Section: Resultsmentioning
confidence: 99%
“…We used the methods and obtained ideal linearity in our previous work. [ 37,38 ] In addition, the cross‐crosstalk phenomenon of the memristor array needs to be considered in the construction of an artificial neural network. It is necessary to eliminate the cross‐talk phenomena of the memristor array in future work.…”
Section: Resultsmentioning
confidence: 99%
“…Utilizing three different voltage signals and resistance states to serve as logic inputs and outputs, the three-valued logic can be established [1,4]. In previous studies, the three-state RS effect can be realized by adjusting the fabrication process of the memristor [6][7][8][9][10]. For example, You et al presented a three-state RS effect based on the asymmetric bipolar memory [11].…”
Section: Introductionmentioning
confidence: 99%
“…Liu et al demonstrated a multi-state RS effect by inserting the BiFeO 3 (BFO) thin film to the HfO 2 memory [7]. Through applying different voltage to the sample and controlling the RS behavior of the memristor, the three-state RS effect can be obtained [6][7][8][9][10]. For the fabricated devices, the external method by tuning the compliance current was developed [12][13][14][15].…”
Section: Introductionmentioning
confidence: 99%
“…Figure a­(i) shows the optical image and a schematic image of the 10 × 10 Ag/HfO 2 /NiO/Pt memristors array, and Figure a­(ii) illustrates an enlarged view of the basic memristor unit. The reconfigurable device consists of a Ag top electrode, HfO 2 (5 nm), NiO (15 nm), and Pt bottom electrode, where the HfO 2 film acts as a blocking layer to limit the diffusion of Ag ions. As shown in Figure c, when the device is stressed by a low compliance current, the device behavior changes to volatile threshold resistive switching. This behavior allows simulation of spiking neuron functions.…”
mentioning
confidence: 99%