Abstract:The interfacial strength of redistribution layer (RDL) and passivation layer plays a crucial role in ensuring the optimal performance and reliability of through silicon vias (TSVs), as it significantly impacts their electrical characteristics and thermal stability, especially in high-density packaging with constrained space. Therefore, it is important to identify and address the interfacial cracks in the RDL that arises due to the factors like manufacturing defects, mechanical stress, and thermal cycling. Negl… Show more
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