2020
DOI: 10.1002/ejic.202000942
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N‐Heterocyclic Silylene Main Group Element Chemistry: Adduct Formation, Insertion into E−X Bonds and Cyclization of Organoazides

Abstract: Investigations concerning the reactivity of the N‐heterocyclic silylene Dipp2NHSi (1, 1,3‐bis(2,6‐diisopropylphenyl)‐1,3‐diaza‐2‐silacyclopent‐4‐en‐2‐ylidene) towards selected alanes and boranes, elemental halides X2 (X=Br, I), selected halide containing substrates such as tin chlorides and halocarbons, as well as organoazides are presented. The NHSi adducts Dipp2NHSi⋅AlI3 (2), Dipp2NHSi⋅Al(C6F5)3 (3), and Dipp2NHSi⋅B(C6F5)3 (4) were formed by the reaction of Dipp2NHSi with the corresponding Lewis acids AlI3, … Show more

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Cited by 11 publications
(12 citation statements)
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“…4 However, this particular silylene, Dipp 2 NHSi, proved to be rather unreactive for small molecule activation. 28 Adduct formation was observed with the Lewis acids AlI 3 , Al(C 6 F 5 ) 3 and B(C 6 F 5 ) 3 which led to isolation of Dipp 2 NHSi•AlI 3 , Dipp 2 NHSi•Al(C 6 F 5 ) 3 and Dipp 2 NHSi•B(C 6 F 5 ) 3 (see Scheme 2). The compound Dipp 2 NHSi•B(C 6 F 5 ) 3 reveals a high thermal stability, which is in contrast to the lability of the literatureknown adduct tBu 2 NHSi•B(C 6 F 5 ) 3 .…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…4 However, this particular silylene, Dipp 2 NHSi, proved to be rather unreactive for small molecule activation. 28 Adduct formation was observed with the Lewis acids AlI 3 , Al(C 6 F 5 ) 3 and B(C 6 F 5 ) 3 which led to isolation of Dipp 2 NHSi•AlI 3 , Dipp 2 NHSi•Al(C 6 F 5 ) 3 and Dipp 2 NHSi•B(C 6 F 5 ) 3 (see Scheme 2). The compound Dipp 2 NHSi•B(C 6 F 5 ) 3 reveals a high thermal stability, which is in contrast to the lability of the literatureknown adduct tBu 2 NHSi•B(C 6 F 5 ) 3 .…”
Section: Discussionmentioning
confidence: 99%
“…Dipp 2 NHSi is a good halide acceptor and reductant in main group chemistry and may be used for controlled redox reactions. The reaction of 1 with one equivalent of Ph 2 SnCl 2 leads exclusively to the dichlorosilane Dipp 2 NHSiCl 2 and cyclic polystannanes (Ph 2 Sn) n (Scheme 2), owing to the strong bond enthalpy of the Si-Cl bond, 28 which also demonstrates the strong halophilicity of the NHSi when reacted with other element halides. To summarize, Dipp 2 NHSi shows some interesting reactivities to selected substrates, but it currently appears that several other silylenes of different ring size or stable acyclic silylenes outperform the five-membered ring NHSis such as 1 as activators of enthalpically strong bonds.…”
Section: Discussionmentioning
confidence: 99%
“…The reaction of :AlAr i Pr8 with 2 equiv of Me 3 SiN 3 gives the amido- azido-alane 3 (Figure , right) as colorless crystals in which silyl migration from the second equivalent of azide to the nitrogen atom of the transient imide has occurred. Such migrations have been observed in a number of reactions of Me 3 SiN 3 with low valent main group compounds. …”
mentioning
confidence: 69%
“…27 Similar five-membered ring compounds were also obtained in the reactions of tetrelenes with organic azides. [28][29][30] In order to test if the chloride in 3 could be replaced by a weakly coordinating anion to give a germanium cation, which might act as a Lewis acid for small molecule activation and catalysis, 31,32 we carried out the reaction of 3 with 1 molar equivalent of NaBAr The molecular structure of 2 was determined by singlecrystal X-ray diffraction (SC-XRD) analysis (Fig. 2).…”
mentioning
confidence: 99%
“…27 Similar five-membered ring compounds were also obtained in the reactions of tetrelenes with organic azides. 28–30…”
mentioning
confidence: 99%