A hydrogen gas sensor based on platinum–titanium–oxygen (Pt–Ti–O) gate silicon-metal-insulator-semiconductor field-effect transistors (Si-MISFETs) was developed. The sensor has a unique gate structure composed of titanium and oxygen accumulated around platinum grains on top of a novel mixed layer of nanocrystalline TiOx and superheavily oxygen-doped amorphous titanium formed on SiO2/Si substrates. The FET hydrogen sensor shows high reliability and high sensing amplitude (ΔVg) defined by the magnitude of the threshold voltage shift. ΔVg is well fitted by a linear function of the logarithm of air-diluted hydrogen concentration C (ppm), i.e., ΔVg(V)=0.355 log C(ppm)−0.610, between 100 ppm and 1%. This high gradient coefficient of ΔVg for the wide sensing range demonstrates that the sensor is suitable for most hydrogen-safety-monitoring sensor systems. The Pt–Ti–O structures of the sensor are typically realized by annealing Pt (15 nm)/Ti (5 nm)-gate Si-metal-oxide-semiconductor structures in air at 400 °C for 2 h. The Pt–Ti–O gate MIS structures were analyzed by transmission electron microscope (TEM), x-ray diffraction, Auger electron spectroscopy, and TEM energy dispersive x-ray spectroscopy. From the viewpoint of practical sensing applications, hydrogen postannealing of the Pt–Ti–O gate Si-MISFETs is necessary to reduce the residual sensing amplitudes with long tailing profiles.