MRS Proc. 1998 DOI: 10.1557/proc-537-g4.11 View full text
C.T. Foxon, T.S. Cheng, D. Korakakis, S.V. Novikov, R.P. Campion, I. Grzegory, S. Porowski, M. Albrecht, H.P. Strunk

Abstract: AbstractVarious methods have been used to initiate growth by Molecular Beam Epitaxy (MBE) of GaN on sapphire, or other substrates, but there is always a problem with morphology and with a high defect density which results in the formation of a sub-grain boundary structure. We show that by using, homo-epitaxial growth on properly prepared bulk GaN substrates, combined with high temperature growth, we obtain a significant improvement in surface morphology. Growth at sufficiently high temperature leads to a rapid…

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