2014
DOI: 10.1364/oe.22.022421
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Holographic fabrication of 3D photonic crystals through interference of multi-beams with 4 + 1, 5 + 1 and 6 + 1 configurations

Abstract: In this paper, we are able to fabricate 3D photonic crystals or quasi-crystals through single beam and single optical element based holographic lithography. The reflective optical elements are used to generate multiple side beams with s-polarization and one central beam with circular polarization which in turn are used for interference based holographic lithography without the need of any other bulk optics. These optical elements have been used to fabricate 3D photonic crystals with 4, 5 or 6-fold symmetry. A … Show more

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Cited by 25 publications
(23 citation statements)
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“…Nanoimprint method was proposed [7] for the fabrication of one and two dimensional PCS in polymethyl-methacrylate, structures with 800 nm period were obtained this way. Using special multi-faced prism, which splits the laser beam into four beams and converges them afterwards on a light-sensitive material, authors of [8] recorded PC with forbidden gap at 1400 nm. In [8] 3D PC was fabricated by the multi-beam holographic lithography in SU-8 photoresist using single optical element, which formed beams' convergence at selected necessary angles.…”
Section: Introductionmentioning
confidence: 99%
“…Nanoimprint method was proposed [7] for the fabrication of one and two dimensional PCS in polymethyl-methacrylate, structures with 800 nm period were obtained this way. Using special multi-faced prism, which splits the laser beam into four beams and converges them afterwards on a light-sensitive material, authors of [8] recorded PC with forbidden gap at 1400 nm. In [8] 3D PC was fabricated by the multi-beam holographic lithography in SU-8 photoresist using single optical element, which formed beams' convergence at selected necessary angles.…”
Section: Introductionmentioning
confidence: 99%
“…Multiple-beam-based interference lithography has been used for the fabrication of a photonic crystal template [12][13][14][15][16][17][18][19]. The use of a phase mask or single reflection optical element has greatly reduced the complexity and has improved the mechanical stability of the optical setup [13][14][15][16][17][18][19]. Recently, SLM has been used as an electrically adjustable phase mask for the interference lithography [20][21][22][23][24][25][26][27].…”
Section: Introductionmentioning
confidence: 99%
“…The use of single refractive [5,6] (or reflective [7]) optical elements or spatial light modulators (SLMs) [8][9][10][11][12][13] has significantly reduced the complexity of the optical setup for multiple-beam interference-based holographic lithography. One can program phase patterns including desired defect features and display them on the SLM.…”
Section: Introductionmentioning
confidence: 99%