2020
DOI: 10.1002/admt.202000626
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Highly Efficient Amplitude Modulation of Terahertz Fano Resonance Based on Si Photoactive Substrate by Low Power Continuous Wave

Abstract: asymmetric feature, which is in direct contrast with the traditional Lorentz resonance. [2] In 1961, Ugo Fano discovered this resonance mode when he studied the auto-ionization state of atoms. [3] With the development of micro-nano science, sharp Fano resonances have been observed from the asymmetric split-ring resonators based on metasurface in recent years. [4,5] The asymmetry of the spectrum is mainly due to the symmetry breaking of the split ring structure, further causing the coupling of the fundamental m… Show more

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Cited by 27 publications
(20 citation statements)
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“…Silicon has semiconductor properties, and high carrier concentrations in all-silicon metasurfaces can be induced by continuous light with high photon energies, the increasing carrier concentration means that the silicon absorbs the incident THz energy gradually. 34 Obviously, as shown in Fig. 4(c), as the pump power of the 1064 nm laser gradually increases, the magnitude of the CD parameter gradually decreases.…”
Section: Resultsmentioning
confidence: 92%
“…Silicon has semiconductor properties, and high carrier concentrations in all-silicon metasurfaces can be induced by continuous light with high photon energies, the increasing carrier concentration means that the silicon absorbs the incident THz energy gradually. 34 Obviously, as shown in Fig. 4(c), as the pump power of the 1064 nm laser gradually increases, the magnitude of the CD parameter gradually decreases.…”
Section: Resultsmentioning
confidence: 92%
“…The TPMS structural designed TMM pressure sensors showed superior pressure sensing performance with both high sensitivity and ultra‐wide sensing range. [ 6,16,38–51 ]…”
Section: Resultsmentioning
confidence: 99%
“…All numerical simulations were completed using the commercial CST Microwave Studio software and the time-domain solver that solved Maxwell's equations by the finite integral time domain [30,31]. The sample preparation adopted the conventional plasma etching method that etched high-resistance silicon (Si) wafer with a thickness of 500 Îźm, conductivity (δ) of 0.03 S m −1 , and refractive index (n Si ) of 3.45.…”
Section: Meta-atom Designmentioning
confidence: 99%