MRS Proc. 2001 DOI: 10.1557/proc-688-c9.9.1 View full text
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Yasuo Cho, Koya Ohara

Abstract: AbstractA higher order nonlinear dielectric microscopy technique with higher lateral and depth resolution than conventional nonlinear dielectric imaging is investigated. The proposed technique involves the measurement of higher order nonlinear dielectric constants, with a depth resolution of down to 1.5 nm. The technique is demonstrated to be very useful for observing surface layers of the order of unit cell thickness on ferroelectric materials.