2017 IEEE International Electron Devices Meeting (IEDM) 2017
DOI: 10.1109/iedm.2017.8268460
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High rejection UNII 5.2GHz wideband bulk acoustic wave filters using undoped single crystal AlN-on-SiC resonators

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Cited by 14 publications
(5 citation statements)
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“…Recent development in 2D piezoelectric materials clearly demonstrate that 3R‐MoS 2 is capable of maintaining its piezoelectricity for the thickness of a few tens of nanometers. [ 36,68 ] Compared to the resonance frequencies and electromechanical coupling coefficients of several thin film resonators reported by different groups since 2000 [ 2,4,43–65 ] as shown in Figure , the 3R‐MoS 2 SMR developed in this study has the highest fundamental resonant frequency and the highest electromechanical coupling coefficient to the best of our knowledge. These results suggest that utilization of 2D 3R‐MoS 2 flakes for FBAR devices could be a feasible way‐out strategy to achieve higher operation frequencies.…”
Section: Resultsmentioning
confidence: 62%
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“…Recent development in 2D piezoelectric materials clearly demonstrate that 3R‐MoS 2 is capable of maintaining its piezoelectricity for the thickness of a few tens of nanometers. [ 36,68 ] Compared to the resonance frequencies and electromechanical coupling coefficients of several thin film resonators reported by different groups since 2000 [ 2,4,43–65 ] as shown in Figure , the 3R‐MoS 2 SMR developed in this study has the highest fundamental resonant frequency and the highest electromechanical coupling coefficient to the best of our knowledge. These results suggest that utilization of 2D 3R‐MoS 2 flakes for FBAR devices could be a feasible way‐out strategy to achieve higher operation frequencies.…”
Section: Resultsmentioning
confidence: 62%
“…Resonance frequencies and electromechanical coupling coefficients of several thin film resonators reported by different groups and this work. [ 2,4,43–65 ] …”
Section: Resultsmentioning
confidence: 99%
“…In 2016, a group from Akoustis Technologies Inc. presented that single crystal AlN-based devices had more than double k eff 2 than poly-crystalline AlN-based devices in the upper bound case, and the FOM is typically 30% higher, although the Q-value is slightly lower in single crystal devices [ 41 ]. In 2017, the same group used metal-organic chemical vapor deposition (MOCVD) to obtain single crystal epitaxial AlN film with 0.5 [ 42 ] and 0.6 [ 36 ] um thickness 4H silicon carbide (SiC) substrates with 150 mm diameter. Resonators showed k eff 2 of 6.32% and 7.63%, and Q max of 1523 and 1572, respectively.…”
Section: Methodsmentioning
confidence: 99%
“…RF silicon-on-insulator (SOI) wafers with 3D monolithic integration, showing significant reduction in footprint and parasitic for RF front-end modules Table shows the comparison among AlScN-based and other piezoelectric material-based resonators. ,,,, Compared with others, CMOS compatible AlScn-based resonators are capable of achieving a high k eff 2 and FOM.…”
Section: Alscn-based Applicationsmentioning
confidence: 99%