High-Rate Anisotropic Ablation and Deposition of Polytetrafluoroethylene Using Synchrotron Radiation Process

Abstract

Both anisotropic ablation and thin film formation of polytetrafluoroethylene (PTFE) were successfully demonstrated using synchrotron radiation (SR) irradiation of PTFE, that is, the SR ablation process. Anisotropic ablation by the SR irradiation was performed at an extremely high rate of 3500 µm/min at a PTFE target temperature of 200° C. Moreover, a PTFE thin film was formed at a high rate of 2.6 µm/min using SR ablation of PTFE. The chemical structure of the deposited film was similar to that of the PTFE target as determined from Fourier transform infrared absorption spectroscopy (FT-IR) analysis.

Rapid X-ray Fabrication of Microstructured Polytetrafluoroethylene Substrates by Anisotropic, Pyrochemical Microetching

“…Recently, it has been determined that synchrotron radiation (SR) can facilitate micron-scale etching of PTFE at a very rapid rate. [2][3][4][5][6][7] Recently, several studies have reported on the microetching of PTFE substrates using SR irradiation. Zhang et al [2] have demonstrated the direct microetching of PTFE substrates with a high aspect ratio using an SR-induced ablation reaction.…”

“…Zhang et al [2] have demonstrated the direct microetching of PTFE substrates with a high aspect ratio using an SR-induced ablation reaction. Inayoshi et al [3] have performed the anisotropic micromachining of PTFE with patterned holes that were 2 m in diameter. They have also determined the etching mechanism of PTFE under SR by using Fourier transform infrared absorption spectroscopy (FT-IR) analysis and in situ quadruple mass spectroscopy (QMS).…”

Ablation of polymers by focused EUV radiation from a table-top laser-produced plasma source

“…Many experiments were performed using synchrotron sources, investigating the influence of low energy density EUV radiation on polymers like PMMA [11][12][13] or PTFE [14][15][16]. In the last years also table-top EUV sources [17,18] were used for structuring of polymers.…”

Ablation of Poly(methyl Methacrylate) by a Single Pulse of Soft X-Rays Emitted From Z-Pinch and Laser-Produced Plasmas

“…[1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16] Ejected material can be collected on a chosen substrate so that high-quality thin films are produced. 4,7,8,14,15 X-ray ablation has also been investigated for making durability assessments of materials suggested for ICF reactor first walls [18][19][20] and optical elements exposed to intense XUV/SXR radiation in a laser-plasma interaction chamber. [21][22][23] XUV/SXR ablation of metals has also been used for determination of the energy content of intense radiation pulses emitted from a hot dense plasma.…”