2017
DOI: 10.1021/acsnano.6b04541
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High-Mobility GaSb Nanostructures Cointegrated with InAs on Si

Abstract: GaSb nanostructures integrated on Si substrates are of high interest for p-type transistors and mid-IR photodetectors. Here, we investigate the metalorganic chemical vapor deposition and properties of GaSb nanostructures monolithically integrated onto silicon-on-insulator wafers using template-assisted selective epitaxy. A high degree of morphological control allows for GaSb nanostructures with critical dimensions down to 20 nm. Detailed investigation of growth parameters reveals that the GaSb growth rate is g… Show more

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Cited by 58 publications
(41 citation statements)
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“…When working on an SOI platform as in [20], the TASE approach supports in-plane integration with Si. Using the same technique, by repeated growth runs, we have also demonstrated the dense local integration of different III-V families on the same silicon wafer [29].…”
Section: Optical Characterizationmentioning
confidence: 93%
“…When working on an SOI platform as in [20], the TASE approach supports in-plane integration with Si. Using the same technique, by repeated growth runs, we have also demonstrated the dense local integration of different III-V families on the same silicon wafer [29].…”
Section: Optical Characterizationmentioning
confidence: 93%
“…Also, antiphase defects and threading dislocations are avoided in this method. So far, high-quality GaSb NWs (figure 1(c)) have been grown by this method which will be discussed in a later part [62].…”
Section: Sagmentioning
confidence: 99%
“…Copyright 2014 American Chemical Society). (c) Selective-area growth (SAG): GaSb NW-like structure grown by template-assisted selective epitaxy (TASE)[62] (adapted with permission from[62]. Copyright 2017 American Chemical Society).…”
mentioning
confidence: 99%
“…In the latter case, no field effect has been reported so far. Meanwhile, GaSb p-type nanowires are also the subject of intense research, much for the same reasons [9][10][11][12][13][14] .…”
Section: Introductionmentioning
confidence: 99%