“…CdS is an important material due to its novel properties like photoconductivity, high index of refraction (2.5) and its high electron affinity [5,6]. Several techniques like vacuum evaporation, sputtering, electro-deposition, radio frequency, pulsed laser evaporation, molecular beam epitaxy (MBE), metal vapour organic deposition (MOCVD), spray pyrolysis deposition (SPD), close spaced sublimation (CSS), successive ionic layer adsorption and reaction (SILAR), Micelle method and chemical bath deposition (CBD) are being used to develop CdS thin films.…”