“…Furthermore, Ge has much higher electron and hole mobility than Si (Sze, 1981), which is especially required when electronic devices are scaled down to the sub-100 nm regime. Several growth methods have been developed for the synthesis of Ge nanowires, including laser ablation (Morales & Lieber, 1998;Zhang et al, 2000), thermal evaporation (Gu et al, 2001;Nguyen et al, 2005;Sun et al, 2006;Das et al, 2007;Sutter et al, 2008), supercriticalfluid synthesis (Ryan et al, 2003;Polyakov et al, 2006;Ziegler et al, 2004;Erts et al, 2006), liquid-state synthesis (Heath & LeGoues, 1993;Song et al, 2009), molecular beam epitaxy (Omi & Ogino, 1997), and chemical vapor deposition (CVD) (Kodambaka et al, 2007;Ryan et al, 2003). CVD has been the most widely employed of these synthesis methods, with the aim of synthesizing Ge nanowires in a controllable way via the selection of suitable Ge ordered mesoporous aluminosilicate thin films (Ryan et al, 2003;Ziegler et al, 2004) and AAO membranes Erts et al, 2006) as templates to grow Ge nanowire arrays by the degradation of diphenylgermane (C 12 H 12 Ge) in supercritical CO 2 .…”