2019
DOI: 10.1039/c9nr00774a
|View full text |Cite
|
Sign up to set email alerts
|

Hierarchical multi-level block copolymer patterns by multiple self-assembly

Abstract: Unusual pattern generation of various 2D and 3D nanostructures can be achieved by the multiple self-assembly of block copolymers (BCPs) such as big-dot, double-dot, line-on-dot, pondering, dot-in-honeycomb, dot-in-pondering, and line-on-pondering patterns.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
16
0

Year Published

2019
2019
2023
2023

Publication Types

Select...
8

Relationship

3
5

Authors

Journals

citations
Cited by 22 publications
(16 citation statements)
references
References 37 publications
0
16
0
Order By: Relevance
“…It is noteworthy that the addition of PS homopolymer chains was crucial to limit the dot overlap between layers, which is a primary concern for enabling density multiplication methodologies. Recently Jung et al proposed a more direct approach to form dense dot layers from sphere‐forming BCP thin films . A double layer of PDMS spherical domains was formed by spin‐coating a concentrated sphere‐forming PS‐ b ‐PDMS solution in toluene.…”
Section: Immobilization Of Bcp Pattern Via Hybridization Methods For mentioning
confidence: 99%
“…It is noteworthy that the addition of PS homopolymer chains was crucial to limit the dot overlap between layers, which is a primary concern for enabling density multiplication methodologies. Recently Jung et al proposed a more direct approach to form dense dot layers from sphere‐forming BCP thin films . A double layer of PDMS spherical domains was formed by spin‐coating a concentrated sphere‐forming PS‐ b ‐PDMS solution in toluene.…”
Section: Immobilization Of Bcp Pattern Via Hybridization Methods For mentioning
confidence: 99%
“…Block copolymer lithography (BCPL) is a patterning method that allows BCPs to selfassemble spontaneously or via directed self-assembly into various polymeric structures of molecular dimensions [195][196][197][198] followed by the selective removal of one of the blocks, for instance via etching, in order to obtain 3D surface relief patterns [19,[199][200][201][202][203][204] (note that the resulting polymeric patterns can further serve as templates for additional surface modification to obtain 3D surface relief patterns of various other non-polymeric materials; see the next section [205,206]). Here, we refer to self-assembly as to a natural nanostructure formation process based on the interplay between van der Waals forces, hydrogen bonding, and hydrophobic interactions that induces a spontaneous ordering of polymer building blocks [207][208][209].…”
Section: Block Copolymer Lithography Based On (Directed) Self-assemblymentioning
confidence: 99%
“…Instead, directed self-assembly [211] uses various external stimuli (e.g., thermal annealing [197,199,209,[212][213][214], solvent annealing [199,200,209,215], thermal and solvent annealing [199], ultrasounds [216], microwaves [217], magnetic fields [218], photoirradiation [219], shearing [220], addition of an ionic liquid [221], controlled spreading area [222], or epitaxy [210,223]) in order to induce and favor the self-assembly process. This process is also favored when employing click chemistry [214], and it displays a series of advantages: high-quality hierarchical [195,224] nanostructures exhibiting a low number of defects can be rapidly generated [195,213] over a large area [222].…”
Section: Block Copolymer Lithography Based On (Directed) Self-assemblymentioning
confidence: 99%
“…For the past several decades, in order to generate well-defined active nanostructures, various lithography methods have been extensively developed, such as photolithography [26,27], nanoimprint lithography (NIL) [28,29], extreme ultraviolet (EUV) lithography [30,31], directed self-assembly (DSA) of block copolymer (BCP) [32][33][34][35], and nanotransfer printing (nTP) [36][37][38][39]. Among these useful lithography methods, nTP has received considerable attention due to its high resolutions, simple process, and good costeffectiveness.…”
Section: Introductionmentioning
confidence: 99%