2015
DOI: 10.1063/1.4907676
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Growth-induced electron mobility enhancement at the LaAlO3/SrTiO3 interface

Abstract: We have studied the electronic properties of the 2D electron liquid present at the LaAlO3/SrTiO3 interface in series of samples prepared at different growth temperatures. We observe that interfaces fabricated at 650 °C exhibit the highest low temperature mobility (≈10 000 cm2 V−1 s−1) and the lowest sheet carrier density (≈5×1012 cm−2). These samples show metallic behavior and Shubnikov-de Haas oscillations in their magnetoresistance. Samples grown at higher temperatures (800–900 °C) display carrier densities … Show more

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Cited by 46 publications
(50 citation statements)
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References 39 publications
(38 reference statements)
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“…At higher temperatures µ I decreases several orders of magnitude and reaches µ I = 7 cm 2 /Vs at room temperature. This trend is similar to what has previously been reported for LAO/STO heterostructures [31].…”
supporting
confidence: 92%
“…At higher temperatures µ I decreases several orders of magnitude and reaches µ I = 7 cm 2 /Vs at room temperature. This trend is similar to what has previously been reported for LAO/STO heterostructures [31].…”
supporting
confidence: 92%
“…[69][70][71][72][73] For instance, reducing the growth temperature 74 or using special cappings of the LAO layer 75 allows mobilities of the order of 10 000 cm 2 /Vs to be reached at low temperature, these are associated with low carrier densities. The electronic structure and the control of superconductivity in such clean interfaces have yet to be determined.…”
Section: Summary and Perspectivesmentioning
confidence: 99%
“…[6][7][8][9][10][11][12][13] Motivated by interest in quantum phenomena and potential applications, multiple studies have specifically sought to improve the low-temperature electron mobility in LAO/STO interfaces. [13][14][15][16][17][18][19][20][21] In spite of more than a decade of research, the dominant scattering mechanism in LAO/STO interfaces, nonetheless, remains elusive.…”
mentioning
confidence: 99%