Generation of short-pulse VUV and XUV radiation

Abstract

Starting from intense short-pulse KrF (248nm, 25m J, 400fs), ArF (193nm, 10m J, ,.~1 ps), and Ti:sapphire (810nm, 100m J, 150fs) laser systems, schemes for the generation of fixed-frequency and tunable VUV and XUV radiation by nonlinear optical techniques are investigated. With the KrF system, a four-wave mixing process in xenon yields tunable radiation in the range of 130-200nm with output energies of, so far, 100 #J in less than 1 ps. For the XUV spectral range below 100 nm, nonperturbative high-order harmonic generation and frequency mixing processes in noble gas jets are considered. To achieve tunability, the intense fixed-frequency pump laser radiation is mixed with less intense but broadly tunable radiation from short-pulse dye lasers or optical parametric generator-amplifier systems. In this way, tunability down to wavelengths of less than 40 nm has been demonstrated.

Time-, angle- and kinetic-energy-resolved photoelectron spectroscopy of highly excited states of NO

“…One established technique for VUV pulse generation makes use of a fourwave mixing (FWM) process. For instance, tunable (130 -200 nm) sub-picosecond pulses with pulse energies of 100 μJ were generated applying near-resonant parametric FWM in xenon [22]. In our laboratory we have recently demonstrated Figure 1.…”