Gaussian beam writing strategy: accuracy of using the shape beam simulator SELID for Gaussian beam systems

Abstract

Obtaining highly aggressive resolution with E-Beam direct writing needs accurate simulation tools. SIGMA-C software SELID TM allows simulating patterns profiles transferred into a resist film in the case of a Shaped Beam system. However EBeam tools that allow achieving very high resolution, especially for dense patterns, are Gaussian Beam systems. This article deals with the comparison of experimental lines obtained with a Gaussian Beam writing system and with simulation by SELID TM of such lines. A negative chemically amplified photo resist (NEB22, Sumitomo) was exposed by our Leica UHR 100 keV. By using a high beam step size with a Gaussian spot 5 nm of FWHM (Full Width at Half Maximum), we showed that Shaped Beam simulations obtained with SELID TM are accurate compared to experiments.