From the Preface to the First Edition

Sandler, Stanley; KARO, WOLF

doi:10.1016/b978-0-08-092556-1.50004-x

Cited by 2 publications

(2 citation statements)

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“…PTBSS and PTBS were prepared and characterized as described in the literature (6.7). Arylmethyl sulfones were purchased commercially or synthesized from the arylmethyl chlorides and sodium hydrosulfite (Na, S,O,) using literature procedures (9). All sulfones were purified by recrystallization before use.…”

Section: Materials Synthesis and Characterizationmentioning

confidence: 99%

Arylmethyl sulfones: A new class of photoacid generators

Novembre

Hanson

Kometani

et al. 1992

Polymer Engineering & Sci

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The X‐ray and deep UV radiation response is described for resist systems consisting of poly(4‐tert‐butoxycarbonyloxystyrene‐co‐sulfur dioxide) PTBSS combined with an arylmethyl sulfone. A 2:1 4‐tert‐butoxycarbonyloxystyrene (TBS): sulfur dioxide (SO2) resist has been found to function as a highly sensitive, 1.4 nm X‐ray, single‐component, chemically amplified resist. The same resist, however, exhibits reduced sensitivity to 0.8 nm X‐rays and deep UV (248 nm) radiation. Improvement in 0.8 nm X‐ray sensitivity is achieved by the addition of 12 mol% bis(3,4‐dichlorobenzyl) sulfone (DCBS) to the 2:1 TBS:SO2 resist. For this two‐component resist formulation, the 0.8 nm X‐ray sensitive improved from >375 to 125 mJ/cm2. Similarly, the sensitivity of the 3:1 TBS:SO2 copolymer to deep UV radiation improves to 40 mJ/cm2 with addition of 10 mol% DCBS. Sulfones, such as DCBS, provide two‐component resist formulations capable of <0.5 μm resolution.

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Section: Materials Synthesis and Characterizationmentioning

confidence: 99%

Arylmethyl sulfones: A new class of photoacid generators

Novembre

Hanson

Kometani

et al. 1992

Polymer Engineering & Sci

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“…The latter reaction produces C-nitroso compounds which usually rearrange to oximino compounds. This reaction has value as a means of introducing an oximino function in a part of molecule that does not have a carbonyl group for direct oximation [4]. The oxidation of oximes with various inorganic acids is a known procedure for the recovery of aldehydes and ketones from their corresponding oximes [5].…”

Section: Introductionmentioning

confidence: 99%

Oxidative Cleavage ofβ-Keto Sulfones via Nitrous Acid

Abdel‐Aziz

2014

Journal of Chemistry

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The reaction of nitrous acid with 1-aryl-2-(arylsulfonyl)ethanones3a–eafforded the unexpected arenecarboxylic acids12a–e, formic acid14, and benzene/4-toluenesulfinic acid15a,bthrough oxidative cleavage reaction. 4-Chlorobenzoic acid (12a), [1,1′-biphenyl]-4-carboxylic acid (12b), 2-naphthoic acid (12c), 2-thiophenecarboxylic acid (12d), and 2-benzofurancarboxylic acid (12e) were isolated in 72%, 62%, 55%, 58%, and 62% yields, respectively. The reported mechanistic pathways proposed the production of 1-aryl-2-(phenyl/tolylsulfonyl)ethane-1,2-dione7instead of arenecarboxylic acids12. A mechanistic pathway to explain the reaction of nitrous acid with 1-aryl-2-(arylsulfonyl)ethanones3a–ewas suggested. In this pathway, the intermediate 1,2-oxazete10lost benzene/4-toluenesulfinic acid15to produce 1,2-oxazet-3-one11. Ring cleavage of the latter intermediate afforded the arenecarboxylic acids12.

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From the Preface to the First Edition

Cited by 2 publications

References 0 publications

Arylmethyl sulfones: A new class of photoacid generators

Arylmethyl sulfones: A new class of photoacid generators

Oxidative Cleavage ofβ-Keto Sulfones via Nitrous Acid

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