Fourier Transform Infrared Characterization of Downstream Gas‐Phase Species Generated by Tetraethylorthosilicate/Ozone Atmospheric Pressure Reactions

Abstract

The effluent gas-phase composition from the atmospheric pressure reaction between tetraethylorthosilicate (TEOS) and ozone was investigated as a function of reactor temperature and initial reactant molar ratio. Online, continuous quantitative determination of gas species was achieved using Fourier transform infrared techniques. TEOS decomposition was a function of initial ozone concentration and reactor temperature. Ozone enhanced TEOS decomposition was found to generate carbon monoxide, carbon dioxide, formic and acetic acids, and water, in addition to unreacted source species.

Large temperature range model for the atmospheric pressure chemical vapor deposition of silicon dioxide films on thermosensitive substrates

“…The chemical vapor deposition (CVD) of SiO 2 has been widely studied since thirty years (Kotani et al, 1989), mainly in semiconductor manufacturing as gate dielectrics (Inoue et al, 1987;Ding et al, 2001), and more recently in membrane-based gas separation and energy harvesting (Choi et al, 2013;Liang et al, 2019;Azizi et al, 2017).…”

An innovative GC-MS, NMR and ESR combined, gas-phase investigation during chemical vapor deposition of silicon oxynitrides films from tris(dimethylsilyl)amine

“…Among them, Zhang et al 26 used GC-MS for the characterization of the gas phase during the deposition of SiC from methyltrichlorosilane in the presence of H2, identifying HCl and SiCl4 molecules as by-products. In the same context, Arno et al 27 used online FT-IR analysis, detecting primarily carboxylic acids and water, among other compounds, during the SiO2 deposition from TEOS and O3. As for Si3N4 films, the gas phase characterization and deposition mechanisms from SiH4 and NH3 by photo-assisted CVD, or from SiH2Cl2 and NH3 by low-pressure CVD have been investigated by transient mass spectroscopy.…”

Boundary Layer Chemistry Probed by in Situ Infrared Spectroscopy during SiO2 Deposition at Atmospheric Pressure from Tetraethylorthosilicate and Ozone

“…Assignment of TEOS/O 3 Reaction Products. Previous researchers investigating the TEOS/O 3 process with FT-IR were able to observe gas-phase byproducts without interference from TEOS and identified acetic acid, formic acid, H 2 O, CO, and CO 2 . In those studies, there were no aldehydes (i.e., acetaldehyde and formaldehyde) detected; however, the authors suspected that the reason the aldehyde products were not observed was that they were being oxidized into the observed acetic acid and formic acid products .…”

“…FT-IR studies of the downstream effluent produced during the reaction of TEOS and O 3 have shown the species listed in Table to be present; however, acetaldehyde, the presumed ultimate source of these species, was not detected in these applications . In contrast to those studies, Mucha et al observed infrared spectroscopic evidence for acetaldehyde and acetic acid generation at temperatures of 247 °C in the downstream effluent.…”