2012
DOI: 10.1016/j.matlet.2012.05.055
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Formation of Ti2AlN nanolaminate films by multilayer-deposition and subsequent rapid thermal annealing

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Cited by 33 publications
(11 citation statements)
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“…The MAX phases have been extensively studied not only in order to shed light on their unique combination of properties but also to explore their potential for numerous industrial applications (see review articles [1,2,3,4] and recent examples [5,6,7,8,9,10,11,12,13]). It has long been appreciated that a promising strategy to tailor properties is to form solid solutions on the M, A and/or X sites [1,2].…”
Section: Introductionmentioning
confidence: 99%
“…The MAX phases have been extensively studied not only in order to shed light on their unique combination of properties but also to explore their potential for numerous industrial applications (see review articles [1,2,3,4] and recent examples [5,6,7,8,9,10,11,12,13]). It has long been appreciated that a promising strategy to tailor properties is to form solid solutions on the M, A and/or X sites [1,2].…”
Section: Introductionmentioning
confidence: 99%
“…Отличие в положениях пиков для профи-лей алюминия и титана составляет 10-15 нм. От-метим, что ранее методом оптической эмисси-онной спектроскопии были исследованы нано-слойные покрытия в системах Ti/Al [13], Ti/AlN [14], Cr/CrN [15] и TiC/VC [16]. Высокое разре-шение для покрытий Cr/Ti по глубине было полу-чено благодаря высокоточному подбору параме-тров травления [7,17].…”
Section: использование метода Gdoes для диагностики покрытийunclassified
“…The elemental layer thicknesses, the count of stack repetitions, total film thicknesses of all samples and the annealing parameters are listed in Table 2. More details about these synthesis processes were recently published [20][21][22].…”
Section: Deposition and Synthesismentioning
confidence: 99%
“…Another approach of thin film MAX phase synthesis is the multilayer synthesis approach depositing elemental multilayer by magnetron sputtering at room temperature and subsequent rapid thermal annealing as used in this work [20][21][22]. Furthermore, depositing of multilayer systems at elevated temperatures [23], and longer thermal processing [24,25] was applied.…”
Section: Introductionmentioning
confidence: 99%
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