In the search for a better write head to be used in high-density magnetic storage systems, Fe-N/Ti-N magnetic multilayers with different thickness Fe-N layers and 2 nm thickness Ti-N layers were prepared by magnetron sputtering. The multilayer structures and magnetic properties were characterized with low-angle scattering, high-angle x-ray diffraction, atomic force microscopy (AFM) and magnetometry. Microhardness and the reduced modulus of the multilayer were measured by using a nanoindenter with a diamond tip in conjunction with AFM. The result of low-angle x-ray scattering of the multilayer shows that it has a periodic structure with sharp, flat interfaces. The structure of an Fe-N/Ti-N periodic multilayer has better mechanical properties than a single-layered Fe-N film while retaining excellent soft magnetic properties. Among the samples studied, the Fe-N(5 nm)/Ti-N(2 nm) multilayer has the best general properties.