Focused ion beam applications to solid state devices

Abstract

The current state of focused ion beam (FIB) applications in relation to solid state devices is reviewed, and recent use of FIB technology for lithography, etching, deposition, and doping are described. Etching and deposition have become essential processes for failure analysis and for mask repair in silicon ULSL production. Furthermore, the FIB doping technique has been used to fabricate quantum effect devices.

High pressure and high temperature induced polymerization of C60 nanotubes

“…Fig. 3a shows the Raman spectrum of the pristine C 60 nanotubes, in which the A g (2) mode is observed at 1468 cm -1 , the same as position as for pristine C 60 bulk crystals. [23] This peak position shows that the pristine C 60 nanotubes are based on monomeric C 60 molecules, which agrees well with the fcc structure observed in our XRD measurements.…”

“…[1][2][3][4][5][6] In particular, a great expectation was placed on the biological and biomedical applications of tubular nanomaterials. [7][8][9] As one of the most important materials of the carbon family, C 60 has many unique properties, such as, fluorescence and biological activities, [10][11][12] which makes it a potential functional material.…”

Fabrication and characterization of a large-area metal nano-grid wave plate

“…The same can also be said about focused ion beam lithography (FIB). 11,12 Furthermore, if the array is supposed to have long-range periodicity, the use of self-organized or self-assembled patterns 13,14 as initial etching masks or templates is not justified. As a matter of fact, the number of fast and cost-effective techniques for fabricating periodic nanostructures of a large surface area, such as nanoimprint lithography, 15 are rather limited, with the majority of these techniques involving optical interference lithography.…”

Focused-ion-beam-induced deposition of superconducting nanowires

“…[1][2][3] This technique, so-called ion beam induced deposition (IBID), is successfully used to repair electronic devices and photomasks. 4,5 The main advantages of IBID are the deposition of the desired patterns of films without the need of a template, such as a mask or resist, and the ability to correct or modify only parts of the overall circuit design, without restarting the whole lithographic process.…”