2009
DOI: 10.1063/1.3055347
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First principles investigation of defect energy levels at semiconductor-oxide interfaces: Oxygen vacancies and hydrogen interstitials in the Si–SiO2–HfO2 stack

Abstract: We introduce a scheme for the calculation of band offsets and defect energy levels at semiconductor-oxide interfaces. Our scheme is based on the use of realistic atomistic models of the interface structure and of hybrid functionals for the evaluation of the electronic structure. This scheme is herein applied to the technologically relevant Si-SiO 2 -HfO 2 stack. Calculated band offsets show a very good agreement with experimental values. In particular, we focus on the energy levels of the oxygen vacancy defect… Show more

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Cited by 43 publications
(25 citation statements)
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“…It is well‐known that the defect structure has an important impact on the chemicophysical properties of the metal oxide. In particular, the dissociation energy of defects is generally smaller (<1.0 eV) . Absorption of the visible light can lead to the dissociation of defects and the generation of photogenerated electrons or holes.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…It is well‐known that the defect structure has an important impact on the chemicophysical properties of the metal oxide. In particular, the dissociation energy of defects is generally smaller (<1.0 eV) . Absorption of the visible light can lead to the dissociation of defects and the generation of photogenerated electrons or holes.…”
Section: Resultsmentioning
confidence: 99%
“…The energy level of DyZr × is located at the top of valence band and that of VO ×× located at the bottom of the conduction band (Fig. ) . When irradiated by visible light, the acceptor defects (DyZr × ) and double donor defects (VO ××) will be dissociated according to the following ways and photoinduced electrons and holes were produced:DyZr ×DyZr .+h.; VO ××VO ..+2e'.…”
Section: Resultsmentioning
confidence: 99%
“…Structural relaxation was done by semilocal approximation of exchange correlation energy [28]. Band gaps and offsets are obtained by hybrid DFT methodology [29], [30]. Ov levels corresponding to different charged states, i.e., no occupancy, single or double electron occupancy are shown.…”
Section: Model Descriptionmentioning
confidence: 99%
“…In particular, Broqvist et al [16][17][18] have employed density functional theory to model an HfO 2 / SiO 2 / Si stack to examine defects created by the oxygen vacancy and the hydrogen interstitial. In particular, Broqvist et al [16][17][18] have employed density functional theory to model an HfO 2 / SiO 2 / Si stack to examine defects created by the oxygen vacancy and the hydrogen interstitial.…”
Section: A Origin Of the Charge And Spatial Distributionmentioning
confidence: 99%