DOI: 10.1557/s43578-021-00457-2
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Abstract: In-situ Ar + -ion etching process is used to extract the defect-induced ultrathin 2D-stanene/stanene-oxide structured nano-materials from transparent conducting tin-dioxide (SnOx) thin films by KRATOS SUPRA spectrometer measurement system. In each etch-cycle during in situ successive Ar + -ion sputtering process, x-ray photoelectron (XPS) and ultraviolet photoemission spectroscopy (UPS) were measured and confirmed the formation of different crystal structures of defect-induced 2D-stanene and/or 2D-stanene oxid… Show more

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