2008 IEEE/LEOS International Conference on Optical MEMs and Nanophotonics 2008
DOI: 10.1109/omems.2008.4607879
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Fabrication of wall-coated Cs vapor cells for a chip-scale atomic clock

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Cited by 2 publications
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“…There is also report on chip scale vapor cell fabrication with octadecyltrimethoxysilane (ODS) coating, which is used in a chip-scale atomic clock. (Hasegawa et al 2008).…”
Section: High Temperature Anti-relaxation Surface Coatingmentioning
confidence: 99%
“…There is also report on chip scale vapor cell fabrication with octadecyltrimethoxysilane (ODS) coating, which is used in a chip-scale atomic clock. (Hasegawa et al 2008).…”
Section: High Temperature Anti-relaxation Surface Coatingmentioning
confidence: 99%
“…It can preserve the rubidium atomic hyperfine polarization during up to 900 collisions, and can be operated at up to 160 • C before its anti-relaxation properties are degraded [133] 1 . An OTS coating in a micro-fabricated anodic-bonded cell for a miniature clock has already been reported [192], but no conclusive proof of anti-relaxation properties being due to the coating and not to a buffer gas was given. Alternative coatings with a similar tail group structure, but different head groups have also been reported: octadecylphosphonic acid monolayers [179] and nonadecylbenzene [193], but only the nonadecylebenzene exhibited anti-relaxation properties.…”
Section: Introductionmentioning
confidence: 99%