2000
DOI: 10.1016/s0022-3093(00)00021-1
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Fabrication of photonic band gap structures in As40S60 by focused ion beam milling

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Cited by 17 publications
(9 citation statements)
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“…at room temperature (RT). NIL is a competing technology to traditional optical lithographic techniques [15], direct laser writing (DLW) [16], holography [17], and focused ion beam (FIB) milling [18], all of which are costly, time-consuming and complex. It is the DLW which has been gaining lots of interest especially for its versatility in patterned shapes and variety of materials being used [19].…”
Section: Introductionmentioning
confidence: 99%
“…at room temperature (RT). NIL is a competing technology to traditional optical lithographic techniques [15], direct laser writing (DLW) [16], holography [17], and focused ion beam (FIB) milling [18], all of which are costly, time-consuming and complex. It is the DLW which has been gaining lots of interest especially for its versatility in patterned shapes and variety of materials being used [19].…”
Section: Introductionmentioning
confidence: 99%
“…A number of applications are found for the FIB, which relate to luminescence properties of materials. For example, the FIB is used for producing photonic structures in silicon layers on insulators (Balasubramanian et al , 2006) and on As 40 S 60 (Dale et al , 2000). Also, when applied to GaN, the FIB causes swelling; enabling the formation of high aspect ratio pillars with only a minor shift in the CL emission spectrum (Wu et al , 2008).…”
Section: Introductionmentioning
confidence: 99%
“…This is a common problem that is often alleviated by using a reactive gas. A previous attempt at PhC fabrication was made in a plate of As 2 S 3 chalcogenide glass by FIB milling with and without the assistance of I 2 gas [12]. The highest aspect ratio of 6:1 was achieved with gas assistance at low beam currents, ≤ 12 pA.…”
Section: Introductionmentioning
confidence: 99%