2014
DOI: 10.7566/jpscp.1.015061
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Abstract: AbstractA microwave discharged produced plasma (MDPP) source is used to generate 13.5 nm extreme ultra violet (EUV) radiation for applications in photolithography. The maximum power of the 2.45 GHz magnetron microwave source is 6 kW and it can be operated in a pulsed mode with repetition frequency up to 100 Hz. The working gas is Xenon at pressure in the range 0.5-1.2 Pa. Radiation in the visible and near UV range is removed with the help of a 100 nm Zr filter. The EUV radiation is reflected using two Mo/Si m…

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