Extreme ultraviolet and soft X-ray imaging with compact, table top laser plasma EUV and SXR sources

Wachulak, P.; Bartnik, A.; Kostecki, J.; Węgrzyński, Łukasz; Fok, Tomasz; Jarocki, R.; Szczurek, M.; Fiedorowicz, Henryk

doi:10.1016/j.nimb.2015.06.004

Cited by 4 publications

(1 citation statement)

References 61 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The double stream gas-puff target source represents a versatile alternative to perform experiments in small academic laboratories without the necessity to access to large-scale facilities, and can be regarded as complementary diagnostic tools for high spatial resolution imaging, obtaining additional information about the objects not directly available using other microscopy techniques. The laser-plasma source based on a double stream gas-puff target was successfully employed, thus far, for different applications [50], such as for shadowgraphy systems [51], radiography [52], radiobiology [53], photoionization [54], metrology [55], plasma channel studies [56] and, as will be shown extensively, imaging experiments [57][58][59].…”

Section: Introductionmentioning

confidence: 99%

Biological Applications of Short Wavelength Microscopy Based on Compact, Laser-Produced Gas-Puff Plasma Source

et al. 2020

View full text Add to dashboard Cite

Over the last decades, remarkable efforts have been made to improve the resolution in photon-based microscopes. The employment of compact sources based on table-top laser-produced soft X-ray (SXR) in the “water window” spectral range (λ = 2.3–4.4 nm) and extreme ultraviolet (EUV) plasma allowed to overcome the limitations imposed by large facilities, such as synchrotrons and X-ray free electron lasers (XFEL), because of their high complexity, costs, and limited user access. A laser-plasma double stream gas-puff target source represents a powerful tool for microscopy operating in transmission mode, significantly improving the spatial resolution into the nanometric scale, comparing to the traditional visible light (optical) microscopes. Such an approach allows generating the plasma efficiently, without debris, providing a high flux of EUV and SXR photons. In this review, we present the development and optimization of desktop imaging systems: a EUV and an SXR full field microscope, allowing to achieve a sub-50 nm spatial resolution with short exposure time and an SXR contact microscope, capable to resolve internal structures in a thin layer of sensitive photoresist. Details about the source, as well as imaging results for biological applications, will be presented and discussed.

show abstract

Section: Introductionmentioning

confidence: 99%

Biological Applications of Short Wavelength Microscopy Based on Compact, Laser-Produced Gas-Puff Plasma Source

et al. 2020

View full text Add to dashboard Cite

show abstract

Precision turning of optical mandrel with high steepness axisymmetric aspheric surface using arc-edged diamond cutter

Sun

Kong

Geng

et al. 2017

Int J Adv Manuf Technol

View full text Add to dashboard Cite

Kr photoionized plasma induced by intense extreme ultraviolet pulses

et al. 2016

View full text Add to dashboard Cite

Irradiation of any gas with an intense EUV (extreme ultraviolet) radiation beam can result in creation of photoionized plasmas. The parameters of such plasmas can be significantly different when compared with those of the laser produced plasmas (LPP) or discharge plasmas. In this work, the photoionized plasmas were created in a krypton gas irradiated using an LPP EUV source operating at a 10 Hz repetition rate. The Kr gas was injected into the vacuum chamber synchronously with the EUV radiation pulses. The EUV beam was focused onto a Kr gas stream using an axisymmetrical ellipsoidal collector. The resulting low temperature Kr plasmas emitted electromagnetic radiation in the wide spectral range. The emission spectra were measured either in the EUV or an optical range. The EUV spectrum was dominated by emission lines originating from Kr III and Kr IV ions, and the UV/VIS spectra were composed from Kr II and Kr I lines. The spectral lines recorded in EUV, UV, and VIS ranges were used for the construction of Boltzmann plots to be used for the estimation of the electron temperature. It was shown that for the lowest Kr III and Kr IV levels, the local thermodynamic equilibrium (LTE) conditions were not fulfilled. The electron temperature was thus estimated based on Kr II and Kr I species where the partial LTE conditions could be expected.

show abstract

Extreme ultraviolet and soft X-ray imaging with compact, table top laser plasma EUV and SXR sources

Cited by 4 publications

References 61 publications

Biological Applications of Short Wavelength Microscopy Based on Compact, Laser-Produced Gas-Puff Plasma Source

Biological Applications of Short Wavelength Microscopy Based on Compact, Laser-Produced Gas-Puff Plasma Source

Precision turning of optical mandrel with high steepness axisymmetric aspheric surface using arc-edged diamond cutter

Kr photoionized plasma induced by intense extreme ultraviolet pulses

Contact Info

Product

Resources

About