Two-dimensional transition metal dichalcogenides (TMDs) have become well-known due to their versatile and tunable physical properties for potential applications, specifically on low-power and optical devices. Here, we explored the structural stability and electronic properties of bulk and thin-film (from 1 up to 6 layers) structures of hafnium dichalcogenides (HfX 2 , X = S, Se, or Te) using first-principles calculations. Our calculations reveal that the most stable phase is 1T for both thin films and bulk. The bulk and thin-film structures of HfTe 2 are semimetallic, while those of HfS 2 and HfSe 2 are insulating. Both HfS 2 and HfSe 2 thin films exhibit a decreasing band gap with increasing thickness, while HfTe 2 thin films remain semimetallic with increasing number of layers. Moreover, van Hove singularity (vHs), due to the contribution of the p z orbital from S atoms, is observed in 3L-HfS 2 at the valence band maximum, which can be further enhanced by applying an in-plane biaxial strain, suggesting possible superconductivity. Finally, the bulk and monolayer band structures of HfTe 2 , under HSE06 and GGA + U with the effective Hubbard U parameter of 4.6 eV, are in good agreement with the experimental ARPES data. Our results indeed show that HfX 2 have sensitive and tunable electronic properties through film thickness control and strain for future potential applications.