Evolution of the electron energy distribution and E-H mode transition in inductively coupled nitrogen plasma

Lee, Hyo-Chang; Lee, Jung‐Kyu; Chung, Chin-Wook

doi:10.1063/1.3361199

Cited by 65 publications

(29 citation statements)

References 26 publications

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“…Turner et al 7 showed evidence of vibration excitation collisions through the EED measurement in N 2 gas CCP. A similar result for vibration excitation collisions was confirmed by Lee et al 21 in the capacitive mode (E mode) of the ICP. Ren et al 22 showed that the actual loss of kinetic energy for electrons and ions that strongly depend on the EED.…”

Section: Introductionsupporting

confidence: 83%

Variation of the electron energy distribution with He dilution in an inductively coupled argon discharge

Lee¹,

Chung²

2012

Physics of Plasmas

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We present experimental evidence of different behaviors of plasma parameters depending on changes in the electron energy distribution (EED), caused by an electron heating mechanism and electronneutral collision processes in an Ar/He mixture inductively coupled plasma. At a low gas pressure of 3 mTorr, where the electron neutral collision frequency m is much smaller than the driving frequency x RF , the EEDs evolved from a bi-Maxwellian distribution to a Maxwellian distribution, due to the efficient heating of low energy electrons when the He flow rate increased at a fixed total gas pressure. The plasma density slowly decreased with the He flow rate portion ([He]/[Ar] þ [He]) in a range of 0%-70%, while the plasma density largely decreased in the He flow rate portion of 70%-100%. On the other hand, at a high gas pressure of 350 mTorr where m ) x RF , the EEDs evolved from a Druyvesteyn-like distribution to a Maxwellian distribution, due to a cooling of low energy electrons and an increase in the population of high energy electrons, when the mixing ratio of the He gas is increased. In this case, plasma density abruptly decreased for a He flow rate ratio of 0%-30%. This result directly shows that the EEDs significantly affect the different variations of plasma parameters, even in the case of the same mixing ratio of the gases. V C 2012 American Institute of Physics. [http://dx.

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Section: Introductionsupporting

confidence: 83%

Variation of the electron energy distribution with He dilution in an inductively coupled argon discharge

Lee¹,

Chung²

2012

Physics of Plasmas

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“…1, 16 One possible explanation for this trend in T e may be the dramatic evolution of the EEPF through the electron heating effect 11,21,[30][31][32][33][34][35][36][37] or electronelectron collisions. 17,26,38,39 However, our experiment was conducted in plasmas having nearly Maxwellian EEPFs. As shown in Fig.…”

mentioning

confidence: 99%

Evolution of electron temperature in inductively coupled plasma

Lee

Seo

Kwon

et al. 2017

Applied Physics Letters

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It is generally recognized that the electron temperature Te either remains constant or decreases slightly with plasma power (plasma density). This trend can be simply verified using a single-step or multi-step fluid global model. In this work, however, we experimentally observed that Te evolved with plasma power in radio frequency (RF) inductively coupled plasmas. In this experiment, the measured electron energy distributions were nearly Maxwellian distribution. In the low RF power regime, Te decreased with increasing plasma power, while it increased with plasma power in the high RF power regime. This evolution of Te could be understood by considering the coupling effect between neutral gas heating and stepwise ionization. Measurement of gas temperature via laser Rayleigh scattering and calculation of Te using the kinetic model, considering both multi-step ionization and gas heating, were in good agreement with the measured value of Te. This result shows that Te is in a stronger dependence on the plasma power.

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“…It is remarkable because, in oxygen containing plasmas, the degradation processes at higher temperatures are accompanied of oxygen functionalization of the organic sample, leading to production of resistant products [25]. H-mode is known to have a higher ion temperature than E-mode [12,13,15] and this is a considerable source of heating in plasmas. Additionally, the higher electron density and electron energy distribution function (EEDF) at lower values, found in H-mode, can also lead to dissociative electron attachment (DEA) on sample surface, which could also increase heating by bond dissociation [26].…”

Section: Resultsmentioning

confidence: 99%

“…, while H-mode ranges from 10 10 to 10 11 cm -3 at the same applied power [8,10,11]; the plasma potential is reduced at the H-mode even with the increase of applied power [12,13]; the EEDF changes to a more Maxwellian electron distribution at the Hmode [9,10,14]; electron temperature is reduced at H-mode, while gas temperature is increased [13][14][15]; electron-electron collision frequency is greatly increased [12]; after the H-mode is initiated, it can be sustained even at lower powers [12,16]; finally, both E and H modes can coexist inside the reactor [9].…”

Section: Introductionmentioning

confidence: 99%

Dependence of E-H transition in argon ICP discharges for treatment of organic molecules

et al. 2018

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Plasma surface cleaning is an alternative process that aims at the fully removal of organic contaminants on several kinds of materials. Despite its advantages, there are still lacks on the comprehension of the complex relations between plasma-generated species and organic molecules during plasma cleaning. In the present work, a linear alkane (hexatriacontane -C 36 H 74 ), used as a contaminant model, was exposed to an Argon radiofrequency (RF) inductively coupled plasma (ICP). The by-products from degradation were monitored by optical emission spectroscopy (OES) and residual gas analysis (RGA), to identify the influence of sample positioning on E and H discharge modes regions. The exposition to H-mode discharge resulted in more intense and profuse emissions of C-H and C 2 systems. RGA results show similar byproducts from degradation in both modes; however, the intensity from treatment in H-mode is largely greater. It was also observed that plasma etching in H-mode is enough to melt the sample, while E-type discharge leaves the surface of the sample apparently unchanged.

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Evolution of the electron energy distribution and E-H mode transition in inductively coupled nitrogen plasma

Cited by 65 publications

References 26 publications

Variation of the electron energy distribution with He dilution in an inductively coupled argon discharge

Variation of the electron energy distribution with He dilution in an inductively coupled argon discharge

Evolution of electron temperature in inductively coupled plasma

Dependence of E-H transition in argon ICP discharges for treatment of organic molecules

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