Microelectronic Engineering
 2008
DOI: 10.1016/j.mee.2007.06.016
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Etching characteristics of photoresist and low-k dielectrics by Ar/O2 ferrite-core inductively coupled plasmas

Hyoun Woo Kim
1
,
Jong Woo Lee
2
,
Woon Suk Hwang
3
et al.
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