Erratum: “Generation of circularly polarized radiation from a compact plasma-based extreme ultraviolet light source for tabletop X-ray magnetic circular dichroism studies” [Rev. Sci. Instrum. 85, 103110 (2014)]

Wilson, Daniel W.; Rudolf, Denis; Weier, Christian; Adam, Roman; Winkler, G.; Frömter, Robert; Danylyuk, Serhiy; Bergmann, K.; Grützmacher, Detlev; Schneider, Claus M.; Juschkin, Larissa

doi:10.1063/1.4902976

Cited by 2 publications

(5 citation statements)

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“…Our experimental tools are based on laboratory discharge EUV sources, where light is emitted from hot and dense plasmas. These sources emit high-energy photons from 1 to 150 nm spectral range [2], covering the "water window" [3] and common absorptions edges [4].…”

Section: Introductionmentioning

confidence: 99%

“…Initially designed for projection EUV lithography, EUV light from the discharge plasma is also used nowadays for metrology purposes, for example, reflectometry [5][6][7], scatterometry [8], photoemission electron microscopy [9], and magnetic polarization spectroscopy [4]. Furthermore, the current applications in nanostructuring using discharge EUV sources are focused on laboratorysize interference lithography [10] as well as resist and optics defectivity studies [11].…”

Section: Introductionmentioning

confidence: 99%

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Ptychographic imaging with partially coherent plasma EUV sources

Bußmann

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Teramoto

et al. 2017

Advanced Optical Technologies

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We report on high-resolution lens-less imaging experiments based on ptychographic scanning coherent diffractive imaging (CDI) method employing compact plasma sources developed for extreme ultraviolet (EUV) lithography applications. Two kinds of discharge sources were used in our experiments: a hollow-cathode-triggered pinch plasma source operated with oxygen and for the first time a laser-assisted discharge EUV source with a liquid tin target. Ptychographic reconstructions of different samples were achieved by applying constraint relaxation to the algorithm. Our ptychography algorithms can handle low spatial coherence and broadband illumination as well as compensate for the residual background due to plasma radiation in the visible spectral range. Image resolution down to 100 nm is demonstrated even for sparse objects, and it is limited presently by the sample structure contrast and the available coherent photon flux. We could extract material properties by the reconstruction of the complex exit-wave field, gaining additional information compared to electron microscopy or CDI with longer-wavelength high harmonic laser sources. Our results show that compact plasma-based EUV light sources of only partial spatial and temporal coherence can be effectively used for lens-less imaging applications. The reported methods may be applied in combination with reflectometry and scatterometry for high-resolution EUV metrology.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Ptychographic imaging with partially coherent plasma EUV sources

Bußmann

Odstrčil

Teramoto

et al. 2017

Advanced Optical Technologies

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“…We also demonstrate that IFS is a powerful tool not only to measure spectrum of the light source itself but also to measure spectral changes caused by transmissive or reflective optics, such as EUV filters and mirrors. To this end, we recovered the spectrum behind a B 4 C∕Si Bragg mirror designed as a linear polarizer for element-selective, magneto-optical measurements at 20.5 nm wavelength (Co 3p absorption edge) [14] and found it to be reflective also for wavelengths above 50 nm. In order to suppress longer wavelengths, we used an Al∕Al 2 O 3 transmission filter and measured its spectral transmission as well.…”

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confidence: 99%

“…EUV light sources of this kind have already been successfully used in a variety of applications, such as EUV lithography [17], spectroscopic reflectometry [18], EUV and soft x-ray microscopy [19,20], and magneto-optical polarization spectroscopy [14]. We operated the gas-discharge EUV light source at 9 J/pulse electrical discharge energy (3.2 kV, 1.75 μF) with a repetition rate of 20 Hz.…”

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Interferometric broadband Fourier spectroscopy with a partially coherent gas-discharge extreme ultraviolet light source

et al. 2015

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Extreme ultraviolet (EUV) spectroscopy is a powerful tool for studying fundamental processes in plasmas as well as for spectral characterization of EUV light sources and EUV optics. However, a simultaneous measurement covering a broadband spectral range is difficult to realize. Here, we propose a method for interferometric broadband Fourier spectroscopy connecting soft x ray and visible spectral ranges with moderate spectral resolution. We present an analytical model to recover the spectrum from a double-slit interferogram. We apply our model for spectral characterization of a partially coherent gas-discharge EUV light source operated with different gases in the spectral range between 10 and 110 nm wavelengths. Our approach allows a simple and fast broadband spectroscopy with fully or partially spatially coherent light sources, for instance, to characterize out-of-band radiation in EUV lithography applications.

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Erratum: “Generation of circularly polarized radiation from a compact plasma-based extreme ultraviolet light source for tabletop X-ray magnetic circular dichroism studies” [Rev. Sci. Instrum. 85, 103110 (2014)]

Cited by 2 publications

References 1 publication

Ptychographic imaging with partially coherent plasma EUV sources

Ptychographic imaging with partially coherent plasma EUV sources

Interferometric broadband Fourier spectroscopy with a partially coherent gas-discharge extreme ultraviolet light source

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