2014
DOI: 10.7566/jpscp.1.015063
View full text
|
|
Share

Abstract: To understand the deposition mechanism during the inductively coupled plasma (ICP) assisted sputter-deposition of transparent conductive Al-doped ZnO (AZO) films, energy flux to a substrate during the deposition was investigated. The total energy flux to a substrate (J) was measured by two types of thermal probes, and the contribution due to charged species was evaluated by the Langmuir probe measurements of plasma parameters. As a result, it was found that i) J was about 3000 Wm-2 for the optimized deposition…

Expand abstract

Search citation statements

Order By: Relevance

Citation Types

0
0
0

Paper Sections

0
0
0
0
0

Publication Types

0
0
0
0

Relationship

0
0

Authors

Journals