Electromagnetic modeling of phase-shifting contact lithography by broadband ultraviolet illumination

Wang, Fei; Weaver, Katherine E.; Lakhtakia, Akhlesh; Horn, Mark W.

doi:10.1117/12.562288

SPIE Proceedings

2004

DOI: 10.1117/12.562288

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Electromagnetic modeling of phase-shifting contact lithography by broadband ultraviolet illumination

Fei Wang

Katherine E. Weaver

Akhlesh Lakhtakia

et al.

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Electromagnetic modeling of phase-shifting contact lithography by broadband ultraviolet illumination

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