Here we report that the Deep Eutectic Solvent (DES), (Ethylene glycol) 2 (Choline chloride), (2Eg:ChCl)is an effective medium in electrolytic removal of the Fe rich layer from Ni based Hot Isostatic Press (HIP) consolidation and that it is capable of sustaining etching at higher rates and at higher current efficiencies than a comparable aqueous electrolyte formulated from methane sulphonic acid / glycolic acid (MSA/GA). At high etch rates the surface finish is not as good using 2Eg:ChCl but high etch rates, current efficiency and excellent surface finish can be obtained from a 90%/10% hybrid mixture of 2Eg:ChCl MSA/GA electrolytes. In this study we have set out to compare the electropolishing and bulk electrolytic etching of HIP formed bodies fabricated from RR1000 Ni based superalloys in aqueous methane sulphonic acid / glycolic acid (MSA/GA) electrolyte and in Deep Eutectic Solvent (DES) type ionic liquids. Samples consisting of HIP formed test coupons were electropolished under a range of conditions of current density and applied potential in either the DES (2Eg:ChCl) or MSA/GA electrolytes. The samples were then characterised using a combination of methods including scanning electron microscopy (SEM), atomic force microscopy (AFM) and optical microscopy. Surface roughness and etch characteristics of the samples were determined after treatment in each of the electrolytes in order to establish the comparative efficacy of the DES. Here we present details of some of the challenges and methodologies as well as characterisation of model test pieces and forms using the scale-up facilities at the Ionic Liquids Demonstrator (ILD) facility at the University of Leicester.We show that the HIP alloy can be effectively removed under mild conditions using DES electrolytes that are of low toxicity, environmentally sustainable, relatively low cost and without the use of strong acids or chemical etchants.