2002
DOI: 10.1016/s1388-2481(02)00510-6
|View full text |Cite
|
Sign up to set email alerts
|

Electroless deposition of gold thin films on silicon for surface-enhanced infrared spectroelectrochemistry

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

10
356
1
6

Year Published

2006
2006
2018
2018

Publication Types

Select...
5
4

Relationship

0
9

Authors

Journals

citations
Cited by 358 publications
(383 citation statements)
references
References 21 publications
10
356
1
6
Order By: Relevance
“…A more detailed description of this flow-cell configuration was previously given in [31]. In brief, the central cell Au film was prepared by electroless deposition following the procedure reported previously [32][33][34]. It has to be thin enough to allow the IR radiation to pass to the nanoparticles, but thick enough to be sufficiently conductive for obtaining a good electrochemical response.…”
Section: Methodsmentioning
confidence: 99%
“…A more detailed description of this flow-cell configuration was previously given in [31]. In brief, the central cell Au film was prepared by electroless deposition following the procedure reported previously [32][33][34]. It has to be thin enough to allow the IR radiation to pass to the nanoparticles, but thick enough to be sufficiently conductive for obtaining a good electrochemical response.…”
Section: Methodsmentioning
confidence: 99%
“…A nanostructured gold film was chemically deposited on an ATR Silicon prism and electrochemically cleaned as previously described in (Miyake et al, 2002). This treatment resulted in island like structures on the gold surface.…”
Section: Seirasmentioning
confidence: 99%
“…Dependent on the use of electrochemical workstation or not, chemical methods are divided into electroless deposition and electrochemical deposition. In electroless deposition, chemical reactions between solutes and prisms take place on the prism surface, forming large area of metal films with islands or gaps [48,49]. A derivate method is to disperse nanocrystal seeds on the prism surface and control the chemical deposition extending from the seeds [21,50].…”
Section: Substrates Fabricationmentioning
confidence: 99%