Electrochemical Deposition of ZnO Thin Films and Nanowires for Photovoltaic Applications

Sanchez, Sylvia; Lévy‐Clément, C.; Ivanova, Valentina

doi:10.1149/2.024212jes

Cited by 35 publications

(24 citation statements)

References 46 publications

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“…The ECD is a simple technique which can produce films over a large area and be easily scaled up to a commercial process at low cost. In fact, ECD has been successfully applied for ZnO [31][32][33][34][35] and Cu 2 O [36][37][38][39].…”

Section: Introductionmentioning

confidence: 99%

Synthesis and characterization of ZnO/Cu2O core–shell nanowires grown by two-step electrodeposition method

Messaoudi

Makhlouf

Souissi

et al. 2015

Applied Surface Science

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Section: Introductionmentioning

confidence: 99%

Synthesis and characterization of ZnO/Cu2O core–shell nanowires grown by two-step electrodeposition method

Messaoudi

Makhlouf

Souissi

et al. 2015

Applied Surface Science

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“…Zinc oxide thin films were electrodeposited from an aqueous solution containing 5 × 10 −3 M ZnCl 2 and 0.1 M KCl . They were prepared potentiostatically at −1.0 V versus saturated calomel electrode (SCE) and the passed charge density was fixed at 0.4 C cm −2 .…”

Section: Methodsmentioning

confidence: 99%

“…ZnO nanowires were grown potentiostatically at −1.0 V versus SCE onto ZnO 2D layers from an aqueous electrolyte containing 5 × 10 −4 M ZnCl 2 and 1 M KCl . The deposition temperature was fixed at 80 °C and the passed charge density was 10 C cm −2 .…”

Section: Methodsmentioning

confidence: 99%

CdTe deposition by successive ionic layer adsorption and reaction (SILAR) technique onto ZnO nanowires

Salazar

Delamoreanu

Saidi

et al. 2014

Phys. Status Solidi A

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In this study is reported CdTe deposition by Successive Ionic Layer Adsorption and reaction (SILAR) at room temperature onto ZnO nanowires (NWs). The as‐deposited CdTe layer exhibits poor crystalline quality and not well defined optical transition which is probably result of its amorphous nature. The implementation of an annealing step and chemical treatment by CdCl2 to the classical SILAR technique improved significantly the CdTe film quality. The XRD analysis showed that the as treated layers are crystallized in the cubic zinc blende structure. The full coverage of ZnO nanowires and thickness of the CdTe shell, composed of small crystallites, was confirmed by STEM and TEM analysis. The layer thickness could be controlled by the number of SILAR cycles. The sharper optical transitions for the annealed and CdCl2 treated heterostructures additionally proves the enhancement of the layer crystalline quality. For comparison CdTe was also deposited by close space sublimation (CSS) method onto ZnO nanowires. It is shown that the SILAR deposited CdTe exhibits equal crystalline and optical properties to that prepared by CSS. These results demonstrate that SILAR technique is more suitable for conformal thin film deposition on nanostructures. CdTe extremely thin film deposited by SILAR method onto ZnO nanowire.

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“…Therefore, in aqueous solutions, the longitudinal growth of hexagonal ZnO nanowires is favored over the lateral one, due to the reaction of Zn 2+ with hydroxyl ions adsorbed on the top of the nanowire (polar face (0001), which hinders the lateral growth 30 . However, if the chloride ion concentration is increased, these ions will be adsorbed on the top, and will not hinder the lateral growth [31][32] . As a result, hexagonal nanowires with different diameters can be performed by controlling the solution composition during the electrodeposition process.…”

Section: Film Characterizationmentioning

confidence: 99%

EFFECT OF CHLORIDE IONS ON THE STRUCTURAL, OPTICAL, MORPHOLOGICAL, AND ELECTROCHEMICAL PROPERTIES OF Cu2O FILMS ELECTRODEPOSITED ON FLUORINE-DOPED TIN OXIDE SUBSTRATE FROM A DMSO SOLUTION

Riveros

León

Ramírez

2016

J. Chil. Chem. Soc.

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This study shows the results attained during the electrodeposition of Cu 2 O films on fluorine-doped tin oxide (FTO) substrate from a dimethyl sulfoxide (DMSO) solution in the presence of chloride ions. Before the film electrodeposition and in order to establish the best conditions for the Cu 2 O electrodeposition, a detailed electrochemical study of the precursors in the presence of chloride ions was performed. The voltammetric profiles obtained show significant differences compared to those previously obtained during the study of the Cu 2 O electrodeposition from a free-chloride DMSO solution. These differences are the result of the coordination complexes formation between chloride ions and the different copper species in solution. The films were potentiostatically electrodeposited between -1.4 V and -1.6 V vs Ag/AgCl (sat) reference electrode. Then, these films were characterized through different techniques: X-ray diffraction, scanning electron microscopy, optical characterization, and capacitance measurements through electrochemical impedance spectroscopy.Keywords: Cu 2 O, Electrodeposition, DMSO solution, Chloride effect. INTRODUCTIONPhotovoltaic devices based on metal oxide semiconductors have being a matter of great interest, because to their chemical stability. This way, due to its properties (p-type semiconductor, direct band gap of 2.0 -2.2 eV) Cu 2 O has been considered an excellent material that can be employed in photovoltaic cells based on p-n junction thin films. Furthermore, Cu 2 O is made up of abundant non-toxic elements, which allows it to become a low-cost material 1 .Cu 2 O thin films have been prepared through the use of different techniques such as magnetron sputtering 2-3 , chemical vapor deposition 4-5 , thermal oxidation 6 , and chemical reduction 7 . Electrochemical techniques are easy and inexpensive methods for Cu 2 O thin films formation. Copper sulfate in the presence of lactic acid / lactate aqueous solution is usually the most used electrolyte for the electrodeposition of Cu 2 O thin film on different substrates [8][9][10] . However, this research group has recently verified that the electrodeposition of Cu 2 O thin films can be carried out from a dimethyl sulfoxide (DMSO) solution, using CuClO 4 and molecular oxygen as precursors 11 . These films were p-type semiconductors with an optical band gap that varied between 2.18 eV -2.25 eV with a doping level between 8.2 x 10 18 cm -3 -2.0 x 10 19 cm -3 , depending on the electrodeposition temperature. On the other hand, it is a well known fact that during the electrodeposition process, the addition of complexing agents produces drastic changes in the morphology and properties of semiconductor materials 12-13 and metals [14][15] . This way, the influence of chloride ions as a complexing agent during the Cu 2 O electrodeposition process from a DMSO solution is analyzed in this article. The results were then compared with those obtained in the absence of chloride ions. The films were smoother than those obtained in the absence ...

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Electrochemical Deposition of ZnO Thin Films and Nanowires for Photovoltaic Applications

Cited by 35 publications

References 46 publications

Synthesis and characterization of ZnO/Cu2O core–shell nanowires grown by two-step electrodeposition method

Synthesis and characterization of ZnO/Cu2O core–shell nanowires grown by two-step electrodeposition method

CdTe deposition by successive ionic layer adsorption and reaction (SILAR) technique onto ZnO nanowires

EFFECT OF CHLORIDE IONS ON THE STRUCTURAL, OPTICAL, MORPHOLOGICAL, AND ELECTROCHEMICAL PROPERTIES OF Cu2O FILMS ELECTRODEPOSITED ON FLUORINE-DOPED TIN OXIDE SUBSTRATE FROM A DMSO SOLUTION

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