2014
DOI: 10.1016/j.tsf.2014.10.072
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Electrochemical deposition of Fe–S–O thin films

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Cited by 12 publications
(7 citation statements)
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“…We also fabricated heterostructures consisting of ECD ZnO and FeS(O) films and observed rectification properties. 9,10) The ECD of FeS 2 was also reported by several other groups. [11][12][13] They all annealed deposited films in a sulfur atmosphere, and none of them reported the fabrication of diodes.…”
supporting
confidence: 73%
See 1 more Smart Citation
“…We also fabricated heterostructures consisting of ECD ZnO and FeS(O) films and observed rectification properties. 9,10) The ECD of FeS 2 was also reported by several other groups. [11][12][13] They all annealed deposited films in a sulfur atmosphere, and none of them reported the fabrication of diodes.…”
supporting
confidence: 73%
“…We have reported the electrochemical deposition (ECD) of iron-sulfide-oxide FeS(O) films. 9,10) The as-deposited films have a band gap of about 1.3 eV and exhibit p-type conductivity and photosensitivity. We also fabricated heterostructures consisting of ECD ZnO and FeS(O) films and observed rectification properties.…”
mentioning
confidence: 99%
“…We observed rectifying properties for heterojunctions with ZnO. 18,19) Rectifying properties have been reported for FeS 2 -based p-n heterojunctions by a few other groups. 20,21) However, photovoltaic properties were not observed even for those rectifying p-n junctions.…”
supporting
confidence: 72%
“…Despite the rather high reactivity of tetra(tert-butoxy)tin, which is comparable to that of chlorosilane species [21],t he careful exclusion of any trace of water during the functionalization process leads to the clean formation of am onolayer (vide infra). Less reactive alkoxy species, as for examplet he tetra(tert-butoxy)zirconium homologue,c an bring about the formation of multilayers as the functionalizationi sc arried out in less strictly dry conditions,s imilarly to what happens with alkoxysilanes on oxide surfaces.…”
Section: Surface Functionalizationmentioning
confidence: 99%