Effects of the surface ligands of quantum dots on the intaglio transfer printing process

Kim, Seo Young; Kwon, Jong Ik; Song, Hyeon Hwa; Lee, Gwang Heon; Yu, Won Seok; Li, Shi; Choi, Moon Kee; Yang, Jiwoong

doi:10.1016/j.apsusc.2022.155579

Applied Surface Science

2023

DOI: 10.1016/j.apsusc.2022.155579

|View full text |Cite

Effects of the surface ligands of quantum dots on the intaglio transfer printing process

Seo Young Kim

Jong Ik Kwon²,

Hyeon Hwa Song³

et al.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

Supporting

Mentioning

Contrasting

Year Published

2023

2024

Publication Types

Select...

Article6

Relationship

Self Cite2

Independent4

Authors

Journals

Cited by 10 publications

(1 citation statement)

References 68 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…However, electroluminescent (EL) devices that fully utilize QD as the light-emitting layer still face many challenges, including uniform patterning of QDs. The most commonly used patterning strategies are inkjet printing, − photolithography, − and transfer printing. − Inkjet printing faces the issues of the coffee ring effect and pixel resolution limitation, and it is difficult to achieve uniform patterns below several micrometers. Transfer printing has been proven to be able to fabricate ultra-high-resolution patterns, while challenges remain in the destruction of patterned films by the elastic stamps during sagging and peeling, as well as precise alignment for full color display.…”

mentioning

confidence: 99%

Ligand-Nondestructive Direct Photolithography Assisted by Semiconductor Polymer Cross-Linking for High-Resolution Quantum Dot Light-Emitting Diodes

Qie,

Hu,

et al. 2024

Nano Lett.

View full text Add to dashboard Cite

The photolithographic patterning of fine quantum dot (QD) films is of great significance for the construction of QD optoelectronic device arrays. However, the photolithography methods reported so far either introduce insulating photoresist or manipulate the surface ligands of QDs, each of which has negative effects on device performance. Here, we report a direct photolithography strategy without photoresist and without engineering the QD surface ligands. Through cross-linking of the surrounding semiconductor polymer, QDs are spatially confined to the network frame of the polymer to form high-quality patterns. More importantly, the wrapped polymer incidentally regulates the energy levels of the emitting layer, which is conducive to improving the hole injection capacity while weakening the electron injection level, to achieve balanced injection of carriers. The patterned QD light-emitting diodes (with a pixel size of 1.5 μm) achieve a high external quantum efficiency of 16.25% and a brightness of >1.4 × 105 cd/m2. This work paves the way for efficient high-resolution QD light-emitting devices.

show abstract

mentioning

confidence: 99%

Ligand-Nondestructive Direct Photolithography Assisted by Semiconductor Polymer Cross-Linking for High-Resolution Quantum Dot Light-Emitting Diodes

Qie,

Hu,

et al. 2024

Nano Lett.

View full text Add to dashboard Cite

show abstract

Patterning Quantum Dots via Photolithography: A Review

et al. 2023

View full text Add to dashboard Cite

Pixelating patterns of red, green, and blue quantum dots (QDs) is a critical challenge for realizing high‐end displays with bright and vivid images for virtual, augmented, and mixed reality. Since QDs must be processed from a solution, their patterning process is completely different from the conventional techniques used in the organic light‐emitting diode and liquid crystal display industries. Although innovative QD patterning technologies are being developed, photopatterning based on the light‐induced chemical conversion of QD films is considered one of the most promising methods for forming micrometer‐scale QD patterns that satisfy the precision and fidelity required for commercialization. Moreover, the practical impact will be significant as it directly exploits mature photolithography technologies and facilities that are widely available in the semiconductor industry. This article reviews recent progress in the effort to form QD patterns via photolithography. The review begins with a general description of the photolithography process. Subsequently, different types of photolithographical methods applicable to QD patterning are introduced, followed by recent achievements using these methods in forming high‐resolution QD patterns. The paper also discusses prospects for future research directions.

show abstract

High‐Resolution Intaglio Transfer Printing of Silver Nanowires for Wearable Electrophysiological Sensors

Kim,

Yang

et al. 2023

Adv Materials Technologies

Self Cite

View full text Add to dashboard Cite

Silver nanowires (NWs) are promising materials for flexible electronics, such as electronic skins due to their excellent electrical, thermal, and mechanical properties. Achieving precise patterning of Ag NWs is essential for the successful integration and miniaturization of the electronic device system, but the high aspect ratio (AR) of NWs and the high porosity of NW networks pose challenges in forming high‐resolution patterns. Herein, the intaglio transfer printing technique to create high‐resolution patterning of ultralong Ag NWs (AR≈1000) is presented. During the pattern formation process, the external force becomes concentrated specifically at the edge of the intaglio trench, resulting in the breaking of the entangled Ag NW network in the corresponding region. This simple yet effective technique enables precise high‐resolution (minimum line width: 7 µm) and complicated Ag NW patterns on flexible substrates. The patterned Ag NWs are conformally attached to the various curvilinear surfaces and show high mechanical stability under continuous bending conditions. Wearable electrophysiological sensors are demonstrated to monitor electromyography and electrocardiogram signals in real‐time for continuous healthcare monitoring. This patterning strategy offers an effective approach for achieving high‐resolution patterns of highly anisotropic nanomaterials and highlights the potential of patterned Ag NWs in wearable electronics.

show abstract

scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.

Contact Info

hi@scite.ai

10624 S. Eastern Ave., Ste. A-614

Henderson, NV 89052, USA

Blog Terms and Conditions API Terms Privacy Policy Contact Cookie Preferences Do Not Sell or Share My Personal Information

Made with 💙 for researchers

Part of the Research Solutions Family.

Effects of the surface ligands of quantum dots on the intaglio transfer printing process

Cited by 10 publications

References 68 publications

Ligand-Nondestructive Direct Photolithography Assisted by Semiconductor Polymer Cross-Linking for High-Resolution Quantum Dot Light-Emitting Diodes

Ligand-Nondestructive Direct Photolithography Assisted by Semiconductor Polymer Cross-Linking for High-Resolution Quantum Dot Light-Emitting Diodes

Patterning Quantum Dots via Photolithography: A Review

High‐Resolution Intaglio Transfer Printing of Silver Nanowires for Wearable Electrophysiological Sensors

Contact Info

Product

Resources

About