2021
DOI: 10.3390/ma14185136
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Effects of Insertion of Ag Mid-Layers on Laser Direct Ablation of Transparent Conductive ITO/Ag/ITO Multilayers: Role of Effective Absorption and Focusing of Photothermal Energy

Abstract: From the viewpoint of the device performance, the fabrication and patterning of oxide–metal–oxide (OMO) multilayers (MLs) as transparent conductive oxide electrodes with a high figure of merit have been extensively investigated for diverse optoelectronic and energy device applications, although the issues of their general concerns about possible shortcomings, such as a more complicated fabrication process with increasing cost, still remain. However, the underlying mechanism by which a thin metal mid-layer affe… Show more

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Cited by 7 publications
(2 citation statements)
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References 49 publications
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“…Metal-oxide semiconductors have attracted considerable attention over the past few decades because of their high transparency [1][2][3][4], large area [5][6][7], and mass production [8], and compatibility with conventional device fabrication processes. Metal-oxide semiconductors contain a metal cation (i.e., Zn, Cu, and Ni) [9,10] and an oxide anion, including ternary metal oxides, such as IZO [11], and quaternary metal oxides, such as IGZO [12].…”
Section: Introductionmentioning
confidence: 99%
“…Metal-oxide semiconductors have attracted considerable attention over the past few decades because of their high transparency [1][2][3][4], large area [5][6][7], and mass production [8], and compatibility with conventional device fabrication processes. Metal-oxide semiconductors contain a metal cation (i.e., Zn, Cu, and Ni) [9,10] and an oxide anion, including ternary metal oxides, such as IZO [11], and quaternary metal oxides, such as IGZO [12].…”
Section: Introductionmentioning
confidence: 99%
“…When the structure's interface temperature exceeds a particular value, distortion develops, affecting heat transport in the system as well as the thermodynamic trajectory, thermal feedback, etching rate, and structure of the target film surface. [10][11][12][13] . A geometric model that matches reality was thus established, and the actual laser etching and processing accuracy of the etched products were guided by and improved by the geometric model.…”
Section: Introductionmentioning
confidence: 99%