2017
DOI: 10.1007/s10854-017-7055-7
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Effects of annealing temperature, ambient humidity and temperature on dielectric properties of sol–gel-derived amorphous alumina thin film

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Cited by 6 publications
(2 citation statements)
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“…Fig. 11B shows the gases released from the sample: H2O (m/z =16, 17,18,19,20), NH3 (m/z = 14, 15,16,17,18), and NO (m/z = 14, 15, 16, 30, 31, 32). 25 The time evolution of NO release (m/z = 30) is shown in Fig.…”
Section: E-beam Exposure Resultsmentioning
confidence: 99%
“…Fig. 11B shows the gases released from the sample: H2O (m/z =16, 17,18,19,20), NH3 (m/z = 14, 15,16,17,18), and NO (m/z = 14, 15, 16, 30, 31, 32). 25 The time evolution of NO release (m/z = 30) is shown in Fig.…”
Section: E-beam Exposure Resultsmentioning
confidence: 99%
“…Humidity is well known to affect sol-gel film formation, especially for hydrous metal oxides during the precursor solution and drying stages. 20,21 In an industrial fab, environmental conditions such as temperature and humidity are rigorously regulated. However, in an academic research laboratory, the ambient environment is not controlled.…”
Section: Humidity Effect and Film Agingmentioning
confidence: 99%